Modelling of point defects in monoclinic zirconia
We present the results of plane wave density functional theory calculations of oxygen vacancies and interstitial oxygen atoms in monoclinic zirconia. After calculating the incorporation energies and structures of interstitial oxygen atoms and formation energies of neutral oxygen vacancies, we consid...
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Veröffentlicht in: | Journal of non-crystalline solids 2002-05, Vol.303 (1), p.101-107 |
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container_title | Journal of non-crystalline solids |
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creator | Foster, A.S. Sulimov, V.B. Lopez Gejo, F. Shluger, A.L. Nieminen, R.M. |
description | We present the results of plane wave density functional theory calculations of oxygen vacancies and interstitial oxygen atoms in monoclinic zirconia. After calculating the incorporation energies and structures of interstitial oxygen atoms and formation energies of neutral oxygen vacancies, we consider the electron affinities and ionisation potentials of these defects. These properties are especially important at the silicon/oxide interface in MOSFET devices, where silicon may serve as an electron and hole source. The results demonstrate that interstitial oxygen atoms and positively charged oxygen vacancies can trap electrons if the electron source (band offset) is higher than ∼2 eV above the top of the zirconia valence band. |
doi_str_mv | 10.1016/S0022-3093(02)00974-2 |
format | Article |
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After calculating the incorporation energies and structures of interstitial oxygen atoms and formation energies of neutral oxygen vacancies, we consider the electron affinities and ionisation potentials of these defects. These properties are especially important at the silicon/oxide interface in MOSFET devices, where silicon may serve as an electron and hole source. 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After calculating the incorporation energies and structures of interstitial oxygen atoms and formation energies of neutral oxygen vacancies, we consider the electron affinities and ionisation potentials of these defects. These properties are especially important at the silicon/oxide interface in MOSFET devices, where silicon may serve as an electron and hole source. The results demonstrate that interstitial oxygen atoms and positively charged oxygen vacancies can trap electrons if the electron source (band offset) is higher than ∼2 eV above the top of the zirconia valence band.</description><subject>Condensed matter: electronic structure, electrical, magnetic, and optical properties</subject><subject>Electron states</subject><subject>Exact sciences and technology</subject><subject>Impurity and defect levels</subject><subject>Other nonmetals</subject><subject>Physics</subject><issn>0022-3093</issn><issn>1873-4812</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2002</creationdate><recordtype>article</recordtype><recordid>eNqNkEtPAyEQgInRxFr9CSZ70ehhFRgWlpMxja-kxoN6JpQFg9lChdVEf730ET3qXMhkvmFmPoQOCT4jmPDzR4wprQFLOMH0FGMpWE230Ii0AmrWErqNRj_ILtrL-RWXENCOELmPne17H16q6KpF9GGoOuusGXLlQzWPIZpS9ab68snE4PU-2nG6z_Zg847R8_XV0-S2nj7c3E0up7UBKYdaNrolgkpCZ9CKxjnuJGZOONYJEII10JTUSAFacEMowcDFTFjCGtIJ5mCMjtf_LlJ8e7d5UHOfTdlVBxvfs6KCEgDK_wNiTsu5Y9SsQZNizsk6tUh-rtOnIlgtTaqVSbXUpDBVK5OKlr6jzQCdje5d0sH4_NsMnHNoceEu1pwtWj68TSobb4OxnU9FqOqi_2PSN1_uhMI</recordid><startdate>20020501</startdate><enddate>20020501</enddate><creator>Foster, A.S.</creator><creator>Sulimov, V.B.</creator><creator>Lopez Gejo, F.</creator><creator>Shluger, A.L.</creator><creator>Nieminen, R.M.</creator><general>Elsevier B.V</general><general>Elsevier</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>8FD</scope><scope>JG9</scope><scope>7QQ</scope></search><sort><creationdate>20020501</creationdate><title>Modelling of point defects in monoclinic zirconia</title><author>Foster, A.S. ; Sulimov, V.B. ; Lopez Gejo, F. ; Shluger, A.L. ; Nieminen, R.M.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c399t-95a8172912b3875ff6f904f7f4d7377453504fc973a76c1210367b7e1451d74f3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2002</creationdate><topic>Condensed matter: electronic structure, electrical, magnetic, and optical properties</topic><topic>Electron states</topic><topic>Exact sciences and technology</topic><topic>Impurity and defect levels</topic><topic>Other nonmetals</topic><topic>Physics</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Foster, A.S.</creatorcontrib><creatorcontrib>Sulimov, V.B.</creatorcontrib><creatorcontrib>Lopez Gejo, F.</creatorcontrib><creatorcontrib>Shluger, A.L.</creatorcontrib><creatorcontrib>Nieminen, R.M.</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Ceramic Abstracts</collection><jtitle>Journal of non-crystalline solids</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Foster, A.S.</au><au>Sulimov, V.B.</au><au>Lopez Gejo, F.</au><au>Shluger, A.L.</au><au>Nieminen, R.M.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Modelling of point defects in monoclinic zirconia</atitle><jtitle>Journal of non-crystalline solids</jtitle><date>2002-05-01</date><risdate>2002</risdate><volume>303</volume><issue>1</issue><spage>101</spage><epage>107</epage><pages>101-107</pages><issn>0022-3093</issn><eissn>1873-4812</eissn><coden>JNCSBJ</coden><abstract>We present the results of plane wave density functional theory calculations of oxygen vacancies and interstitial oxygen atoms in monoclinic zirconia. After calculating the incorporation energies and structures of interstitial oxygen atoms and formation energies of neutral oxygen vacancies, we consider the electron affinities and ionisation potentials of these defects. These properties are especially important at the silicon/oxide interface in MOSFET devices, where silicon may serve as an electron and hole source. The results demonstrate that interstitial oxygen atoms and positively charged oxygen vacancies can trap electrons if the electron source (band offset) is higher than ∼2 eV above the top of the zirconia valence band.</abstract><cop>Amsterdam</cop><pub>Elsevier B.V</pub><doi>10.1016/S0022-3093(02)00974-2</doi><tpages>7</tpages></addata></record> |
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subjects | Condensed matter: electronic structure, electrical, magnetic, and optical properties Electron states Exact sciences and technology Impurity and defect levels Other nonmetals Physics |
title | Modelling of point defects in monoclinic zirconia |
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