Evolution of microstructure and magnetoresistance in Co/Cu multilayers during annealing
Co/Cu multilayers [Co (1.5 nm)/Cu (4 nm)] 35 made by magnetron sputtering have been investigated by vibrating-sample magnetometry, electrical resistance measurements and low-angle X-ray diffractometry before and after annealing at 275°C< T
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| Veröffentlicht in: | Journal of magnetism and magnetic materials 1999-09, Vol.204 (1), p.61-67 |
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| container_end_page | 67 |
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| container_issue | 1 |
| container_start_page | 61 |
| container_title | Journal of magnetism and magnetic materials |
| container_volume | 204 |
| creator | Rätzke, K Hall, M.J Jardine, D.B Shih, W.C Somekh, R.E Greer, A.L |
| description | Co/Cu multilayers [Co (1.5
nm)/Cu (4
nm)]
35 made by magnetron sputtering have been investigated by vibrating-sample magnetometry, electrical resistance measurements and low-angle X-ray diffractometry before and after annealing at 275°C<
T |
| doi_str_mv | 10.1016/S0304-8853(99)00448-5 |
| format | Article |
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nm)/Cu (4
nm)]
35 made by magnetron sputtering have been investigated by vibrating-sample magnetometry, electrical resistance measurements and low-angle X-ray diffractometry before and after annealing at 275°C<
T<350°C for selected times. The observed changes in electrical and magnetic properties are small and consistent with a break-up of the Co layers by diffusion of Cu along the grain boundaries within them. The study of the early stages of break-up is facilitated by choosing layer thicknesses greater than would be optimal for GMR.</description><identifier>ISSN: 0304-8853</identifier><identifier>DOI: 10.1016/S0304-8853(99)00448-5</identifier><identifier>CODEN: JMMMDC</identifier><language>eng</language><publisher>Amsterdam: Elsevier B.V</publisher><subject>Annealing ; Applied sciences ; Condensed matter: electronic structure, electrical, magnetic, and optical properties ; Condensed matter: structure, mechanical and thermal properties ; Exact sciences and technology ; Giant magnetoresistance ; Low-dimensional structures (superlattices, quantum well structures, multilayers): structure, and nonelectronic properties ; Magnetic properties and materials ; Magnetotransport phenomena, materials for magnetotransport ; Metals. Metallurgy ; Multilayers ; Physics ; Structural changes ; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</subject><ispartof>Journal of magnetism and magnetic materials, 1999-09, Vol.204 (1), p.61-67</ispartof><rights>1999 Elsevier Science B.V.</rights><rights>1999 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c398t-47ad3248a566e313f87e19266a7109e8b3b60c95d22350146ee883385d8317f13</citedby><cites>FETCH-LOGICAL-c398t-47ad3248a566e313f87e19266a7109e8b3b60c95d22350146ee883385d8317f13</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://dx.doi.org/10.1016/S0304-8853(99)00448-5$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>314,777,781,3537,27905,27906,45976</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=1881345$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Rätzke, K</creatorcontrib><creatorcontrib>Hall, M.J</creatorcontrib><creatorcontrib>Jardine, D.B</creatorcontrib><creatorcontrib>Shih, W.C</creatorcontrib><creatorcontrib>Somekh, R.E</creatorcontrib><creatorcontrib>Greer, A.L</creatorcontrib><title>Evolution of microstructure and magnetoresistance in Co/Cu multilayers during annealing</title><title>Journal of magnetism and magnetic materials</title><description>Co/Cu multilayers [Co (1.5
nm)/Cu (4
nm)]
35 made by magnetron sputtering have been investigated by vibrating-sample magnetometry, electrical resistance measurements and low-angle X-ray diffractometry before and after annealing at 275°C<
T<350°C for selected times. The observed changes in electrical and magnetic properties are small and consistent with a break-up of the Co layers by diffusion of Cu along the grain boundaries within them. The study of the early stages of break-up is facilitated by choosing layer thicknesses greater than would be optimal for GMR.</description><subject>Annealing</subject><subject>Applied sciences</subject><subject>Condensed matter: electronic structure, electrical, magnetic, and optical properties</subject><subject>Condensed matter: structure, mechanical and thermal properties</subject><subject>Exact sciences and technology</subject><subject>Giant magnetoresistance</subject><subject>Low-dimensional structures (superlattices, quantum well structures, multilayers): structure, and nonelectronic properties</subject><subject>Magnetic properties and materials</subject><subject>Magnetotransport phenomena, materials for magnetotransport</subject><subject>Metals. Metallurgy</subject><subject>Multilayers</subject><subject>Physics</subject><subject>Structural changes</subject><subject>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</subject><issn>0304-8853</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1999</creationdate><recordtype>article</recordtype><recordid>eNqNkE1LxDAQhntQcF39CUIPInqomzRNmpxEyvoBCx5UPIZsOl0ibbPmY2H_ve3uokc9zTA878zwJMkFRrcYYTZ7RQQVGeeUXAtxg1BR8IweJZOf8Uly6v0nQggXnE2Sj_nGtjEY26e2STujnfXBRR2ig1T1ddqpVQ_BOvDGB9VrSE2fVnZWxbSLbTCt2oLzaR2d6VdDogfVDt1Zctyo1sP5oU6T94f5W_WULV4en6v7RaaJ4CErSlWTvOCKMgYEk4aXgEXOmCoxEsCXZMmQFrTOc0KHlxkA54RwWnOCywaTaXK137t29iuCD7IzXkPbqh5s9DIvc4SpKP4BYs4wIgNI9-Cowjto5NqZTrmtxEiOjuXOsRxlSiHkzrGkQ-7ycEB5rdrGDbKM_w1zjkkxYnd7DAYrGwNOem1g8FobBzrI2po_Dn0DybiSCw</recordid><startdate>19990901</startdate><enddate>19990901</enddate><creator>Rätzke, K</creator><creator>Hall, M.J</creator><creator>Jardine, D.B</creator><creator>Shih, W.C</creator><creator>Somekh, R.E</creator><creator>Greer, A.L</creator><general>Elsevier B.V</general><general>Elsevier Science</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>8BQ</scope><scope>8FD</scope><scope>H8G</scope><scope>JG9</scope><scope>7SP</scope><scope>L7M</scope></search><sort><creationdate>19990901</creationdate><title>Evolution of microstructure and magnetoresistance in Co/Cu multilayers during annealing</title><author>Rätzke, K ; Hall, M.J ; Jardine, D.B ; Shih, W.C ; Somekh, R.E ; Greer, A.L</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c398t-47ad3248a566e313f87e19266a7109e8b3b60c95d22350146ee883385d8317f13</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1999</creationdate><topic>Annealing</topic><topic>Applied sciences</topic><topic>Condensed matter: electronic structure, electrical, magnetic, and optical properties</topic><topic>Condensed matter: structure, mechanical and thermal properties</topic><topic>Exact sciences and technology</topic><topic>Giant magnetoresistance</topic><topic>Low-dimensional structures (superlattices, quantum well structures, multilayers): structure, and nonelectronic properties</topic><topic>Magnetic properties and materials</topic><topic>Magnetotransport phenomena, materials for magnetotransport</topic><topic>Metals. Metallurgy</topic><topic>Multilayers</topic><topic>Physics</topic><topic>Structural changes</topic><topic>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Rätzke, K</creatorcontrib><creatorcontrib>Hall, M.J</creatorcontrib><creatorcontrib>Jardine, D.B</creatorcontrib><creatorcontrib>Shih, W.C</creatorcontrib><creatorcontrib>Somekh, R.E</creatorcontrib><creatorcontrib>Greer, A.L</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Copper Technical Reference Library</collection><collection>Materials Research Database</collection><collection>Electronics & Communications Abstracts</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Journal of magnetism and magnetic materials</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Rätzke, K</au><au>Hall, M.J</au><au>Jardine, D.B</au><au>Shih, W.C</au><au>Somekh, R.E</au><au>Greer, A.L</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Evolution of microstructure and magnetoresistance in Co/Cu multilayers during annealing</atitle><jtitle>Journal of magnetism and magnetic materials</jtitle><date>1999-09-01</date><risdate>1999</risdate><volume>204</volume><issue>1</issue><spage>61</spage><epage>67</epage><pages>61-67</pages><issn>0304-8853</issn><coden>JMMMDC</coden><abstract>Co/Cu multilayers [Co (1.5
nm)/Cu (4
nm)]
35 made by magnetron sputtering have been investigated by vibrating-sample magnetometry, electrical resistance measurements and low-angle X-ray diffractometry before and after annealing at 275°C<
T<350°C for selected times. The observed changes in electrical and magnetic properties are small and consistent with a break-up of the Co layers by diffusion of Cu along the grain boundaries within them. The study of the early stages of break-up is facilitated by choosing layer thicknesses greater than would be optimal for GMR.</abstract><cop>Amsterdam</cop><pub>Elsevier B.V</pub><doi>10.1016/S0304-8853(99)00448-5</doi><tpages>7</tpages></addata></record> |
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| ispartof | Journal of magnetism and magnetic materials, 1999-09, Vol.204 (1), p.61-67 |
| issn | 0304-8853 |
| language | eng |
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| source | Elsevier ScienceDirect Journals Complete |
| subjects | Annealing Applied sciences Condensed matter: electronic structure, electrical, magnetic, and optical properties Condensed matter: structure, mechanical and thermal properties Exact sciences and technology Giant magnetoresistance Low-dimensional structures (superlattices, quantum well structures, multilayers): structure, and nonelectronic properties Magnetic properties and materials Magnetotransport phenomena, materials for magnetotransport Metals. Metallurgy Multilayers Physics Structural changes Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) |
| title | Evolution of microstructure and magnetoresistance in Co/Cu multilayers during annealing |
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