Hydrogen incorporation in Ni-P films prepared by electroless deposition
Electroless NiP films, with 12 to 16 wt% P, were deposited from a moderately acid solution. Thermogravimetric analysis indicates the presence of occluded hydrogen in the layers, which desorbs upon heating. The amount of incorporated hydrogen decreases when the pH of the solution or the nickel sulfat...
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| Veröffentlicht in: | Journal of applied electrochemistry 2002-12, Vol.32 (12), p.1331-1336 |
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| container_issue | 12 |
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| container_title | Journal of applied electrochemistry |
| container_volume | 32 |
| creator | SAAOUDI, M CHASSAING, E CHERKAOUI, M EBNTOUHAMI, M |
| description | Electroless NiP films, with 12 to 16 wt% P, were deposited from a moderately acid solution. Thermogravimetric analysis indicates the presence of occluded hydrogen in the layers, which desorbs upon heating. The amount of incorporated hydrogen decreases when the pH of the solution or the nickel sulfate concentration is increased; by contrast it increases with hypophosphite concentration. Cyclic voltammetry, using an electrochemical quartz crystal microbalance, confirms the existence of parasitic reactions, namely the reduction of protons of the solvent during the cathodic process and oxidation of hydrogen during the dissolution of the layers. This behaviour is in qualitative agreement with the proposed reaction scheme. |
| doi_str_mv | 10.1023/A:1022691218053 |
| format | Article |
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Thermogravimetric analysis indicates the presence of occluded hydrogen in the layers, which desorbs upon heating. The amount of incorporated hydrogen decreases when the pH of the solution or the nickel sulfate concentration is increased; by contrast it increases with hypophosphite concentration. Cyclic voltammetry, using an electrochemical quartz crystal microbalance, confirms the existence of parasitic reactions, namely the reduction of protons of the solvent during the cathodic process and oxidation of hydrogen during the dissolution of the layers. 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Thermogravimetric analysis indicates the presence of occluded hydrogen in the layers, which desorbs upon heating. The amount of incorporated hydrogen decreases when the pH of the solution or the nickel sulfate concentration is increased; by contrast it increases with hypophosphite concentration. Cyclic voltammetry, using an electrochemical quartz crystal microbalance, confirms the existence of parasitic reactions, namely the reduction of protons of the solvent during the cathodic process and oxidation of hydrogen during the dissolution of the layers. This behaviour is in qualitative agreement with the proposed reaction scheme.</description><subject>Applied sciences</subject><subject>Chemistry</subject><subject>Electrochemistry</subject><subject>Electrodeposition</subject><subject>Exact sciences and technology</subject><subject>General and physical chemistry</subject><subject>Metallic coatings</subject><subject>Metals. 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Metallurgy</topic><topic>Production techniques</topic><topic>Study of interfaces</topic><topic>Surface treatment</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>SAAOUDI, M</creatorcontrib><creatorcontrib>CHASSAING, E</creatorcontrib><creatorcontrib>CHERKAOUI, M</creatorcontrib><creatorcontrib>EBNTOUHAMI, M</creatorcontrib><collection>Pascal-Francis</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Journal of applied electrochemistry</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>SAAOUDI, M</au><au>CHASSAING, E</au><au>CHERKAOUI, M</au><au>EBNTOUHAMI, M</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Hydrogen incorporation in Ni-P films prepared by electroless deposition</atitle><jtitle>Journal of applied electrochemistry</jtitle><date>2002-12-01</date><risdate>2002</risdate><volume>32</volume><issue>12</issue><spage>1331</spage><epage>1336</epage><pages>1331-1336</pages><issn>0021-891X</issn><eissn>1572-8838</eissn><coden>JAELBJ</coden><abstract>Electroless NiP films, with 12 to 16 wt% P, were deposited from a moderately acid solution. Thermogravimetric analysis indicates the presence of occluded hydrogen in the layers, which desorbs upon heating. The amount of incorporated hydrogen decreases when the pH of the solution or the nickel sulfate concentration is increased; by contrast it increases with hypophosphite concentration. Cyclic voltammetry, using an electrochemical quartz crystal microbalance, confirms the existence of parasitic reactions, namely the reduction of protons of the solvent during the cathodic process and oxidation of hydrogen during the dissolution of the layers. This behaviour is in qualitative agreement with the proposed reaction scheme.</abstract><cop>Heidelberg</cop><pub>Springer</pub><doi>10.1023/A:1022691218053</doi><tpages>6</tpages></addata></record> |
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| language | eng |
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| source | SpringerNature Journals |
| subjects | Applied sciences Chemistry Electrochemistry Electrodeposition Exact sciences and technology General and physical chemistry Metallic coatings Metals. Metallurgy Production techniques Study of interfaces Surface treatment |
| title | Hydrogen incorporation in Ni-P films prepared by electroless deposition |
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