Deposition of diamond-like carbon films by barrier discharge plasma with 1.4 and 20 kHz power sources

Hydrogenated diamond-like carbon (DLC) films were deposited on Si substrates at 1.4 and 20 kHz a.c. power frequencies by dielectric barrier discharge (DBD) technology. Atomic force microscope analysis showed that the roughness parameter R q changed from 0.27 to 0.107 nm with decreasing the depositio...

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Veröffentlicht in:	Thin solid films 2002-07, Vol.414 (2), p.163-169
Hauptverfasser:	Liu, Dongping, Yu, Shiji, Liu, Yanhong, Ren, Cunsheng, Zhang, Jialiang, Ma, Tengcai
Format:	Artikel
Sprache:	eng
Schlagworte:	Cross-disciplinary physics: materials science rheology Diamond-like carbon Dielectric barrier discharge Exact sciences and technology Fourier transform infrared spectroscopy Materials science Methods of deposition of films and coatings film growth and epitaxy Physics Physics of gases, plasmas and electric discharges Physics of plasmas and electric discharges Plasma applications Surface roughness Vapor phase epitaxy growth from vapor phase
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