Voltammetric characterization of oxide films formed on copper in air

Oxide layers thermally formed on copper have been studied using double sweep cyclic voltammetry in strongly alkaline electrolytes. It was found that the addition of 1 M LiOH in an electrolyte (6 M KOH) allowed perfect resolution of cathodic waves due to the reduction of Cu sub 2 O and CuO. Assignmen...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Journal of the Electrochemical Society 2001-11, Vol.148 (11), p.B467-B472
Hauptverfasser: NAKAYAMA, Shigeyoshi, KIMURA, Atsushi, SHIBATA, Masahiro, KUWABATA, Susumu, OSAKAI, Toshiyuki
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page B472
container_issue 11
container_start_page B467
container_title Journal of the Electrochemical Society
container_volume 148
creator NAKAYAMA, Shigeyoshi
KIMURA, Atsushi
SHIBATA, Masahiro
KUWABATA, Susumu
OSAKAI, Toshiyuki
description Oxide layers thermally formed on copper have been studied using double sweep cyclic voltammetry in strongly alkaline electrolytes. It was found that the addition of 1 M LiOH in an electrolyte (6 M KOH) allowed perfect resolution of cathodic waves due to the reduction of Cu sub 2 O and CuO. Assignment of the two reduction waves has been achieved with the help of spectrophotometric techniques including X-ray photoelectron spectroscopy and X-ray diffraction; the cathodic wave appearing between -1.3 and -1.5 V (vs. Ag/AgCl) was attributed to the reduction of Cu sub 2 O, while that appearing at a less negative potential (-1.0 to -1.1 V) was attributed to the reduction of CuO. The electrochemical measurement of samples prepared under several conditions has revealed that CuO is reduced at once to Cu prior to the reduction of Cu sub 2 O. It was also confirmed that the formation of the oxide films was accelerated by elevating temperature, heightening humidity, and by preimmersion in electrolyte solutions. Water vapor was essential for the formation of CuO at a lower temperature (80 deg C).
doi_str_mv 10.1149/1.1409545
format Article
fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_27049171</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>27049171</sourcerecordid><originalsourceid>FETCH-LOGICAL-c354t-4b2ecd3b59f843fc721beb6ed4dd18046b453379eac70aad448c64d048cb666a3</originalsourceid><addsrcrecordid>eNpFkE1LxDAYhIMouK4e_Ae5KHjomrd527RHWT9hwYt6LW_zgZG2qUkX1F9vZRc8DcM8M4dh7BzECgDra1gBirrA4oAtoMYiUwBwyBZCgMywLOCYnaT0MVuoUC3Y7VvoJup7O0WvuX6nSHqy0f_Q5MPAg-PhyxvLne_6xF2IvTV8DnQYRxu5Hzj5eMqOHHXJnu11yV7v717Wj9nm-eFpfbPJtCxwyrDNrTayLWpXoXRa5dDatrQGjYFKYNliIaWqLWkliAxipUs0Ypa2LEuSS3a52x1j-NzaNDW9T9p2HQ02bFOTK4E1KJjBqx2oY0gpWteM0fcUvxsQzd9PDTT7n2b2Yj9KSVPnIg3ap_8CQq6gzuUvqiFnMA</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>27049171</pqid></control><display><type>article</type><title>Voltammetric characterization of oxide films formed on copper in air</title><source>Institute of Physics Journals</source><creator>NAKAYAMA, Shigeyoshi ; KIMURA, Atsushi ; SHIBATA, Masahiro ; KUWABATA, Susumu ; OSAKAI, Toshiyuki</creator><creatorcontrib>NAKAYAMA, Shigeyoshi ; KIMURA, Atsushi ; SHIBATA, Masahiro ; KUWABATA, Susumu ; OSAKAI, Toshiyuki</creatorcontrib><description>Oxide layers thermally formed on copper have been studied using double sweep cyclic voltammetry in strongly alkaline electrolytes. It was found that the addition of 1 M LiOH in an electrolyte (6 M KOH) allowed perfect resolution of cathodic waves due to the reduction of Cu sub 2 O and CuO. Assignment of the two reduction waves has been achieved with the help of spectrophotometric techniques including X-ray photoelectron spectroscopy and X-ray diffraction; the cathodic wave appearing between -1.3 and -1.5 V (vs. Ag/AgCl) was attributed to the reduction of Cu sub 2 O, while that appearing at a less negative potential (-1.0 to -1.1 V) was attributed to the reduction of CuO. The electrochemical measurement of samples prepared under several conditions has revealed that CuO is reduced at once to Cu prior to the reduction of Cu sub 2 O. It was also confirmed that the formation of the oxide films was accelerated by elevating temperature, heightening humidity, and by preimmersion in electrolyte solutions. Water vapor was essential for the formation of CuO at a lower temperature (80 deg C).</description><identifier>ISSN: 0013-4651</identifier><identifier>EISSN: 1945-7111</identifier><identifier>DOI: 10.1149/1.1409545</identifier><identifier>CODEN: JESOAN</identifier><language>eng</language><publisher>Pennington, NJ: Electrochemical Society</publisher><subject>Chemistry ; Electrochemistry ; Electrodeposition ; Exact sciences and technology ; General and physical chemistry ; Study of interfaces</subject><ispartof>Journal of the Electrochemical Society, 2001-11, Vol.148 (11), p.B467-B472</ispartof><rights>2002 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c354t-4b2ecd3b59f843fc721beb6ed4dd18046b453379eac70aad448c64d048cb666a3</citedby><cites>FETCH-LOGICAL-c354t-4b2ecd3b59f843fc721beb6ed4dd18046b453379eac70aad448c64d048cb666a3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27924,27925</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&amp;idt=14127192$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>NAKAYAMA, Shigeyoshi</creatorcontrib><creatorcontrib>KIMURA, Atsushi</creatorcontrib><creatorcontrib>SHIBATA, Masahiro</creatorcontrib><creatorcontrib>KUWABATA, Susumu</creatorcontrib><creatorcontrib>OSAKAI, Toshiyuki</creatorcontrib><title>Voltammetric characterization of oxide films formed on copper in air</title><title>Journal of the Electrochemical Society</title><description>Oxide layers thermally formed on copper have been studied using double sweep cyclic voltammetry in strongly alkaline electrolytes. It was found that the addition of 1 M LiOH in an electrolyte (6 M KOH) allowed perfect resolution of cathodic waves due to the reduction of Cu sub 2 O and CuO. Assignment of the two reduction waves has been achieved with the help of spectrophotometric techniques including X-ray photoelectron spectroscopy and X-ray diffraction; the cathodic wave appearing between -1.3 and -1.5 V (vs. Ag/AgCl) was attributed to the reduction of Cu sub 2 O, while that appearing at a less negative potential (-1.0 to -1.1 V) was attributed to the reduction of CuO. The electrochemical measurement of samples prepared under several conditions has revealed that CuO is reduced at once to Cu prior to the reduction of Cu sub 2 O. It was also confirmed that the formation of the oxide films was accelerated by elevating temperature, heightening humidity, and by preimmersion in electrolyte solutions. Water vapor was essential for the formation of CuO at a lower temperature (80 deg C).</description><subject>Chemistry</subject><subject>Electrochemistry</subject><subject>Electrodeposition</subject><subject>Exact sciences and technology</subject><subject>General and physical chemistry</subject><subject>Study of interfaces</subject><issn>0013-4651</issn><issn>1945-7111</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2001</creationdate><recordtype>article</recordtype><recordid>eNpFkE1LxDAYhIMouK4e_Ae5KHjomrd527RHWT9hwYt6LW_zgZG2qUkX1F9vZRc8DcM8M4dh7BzECgDra1gBirrA4oAtoMYiUwBwyBZCgMywLOCYnaT0MVuoUC3Y7VvoJup7O0WvuX6nSHqy0f_Q5MPAg-PhyxvLne_6xF2IvTV8DnQYRxu5Hzj5eMqOHHXJnu11yV7v717Wj9nm-eFpfbPJtCxwyrDNrTayLWpXoXRa5dDatrQGjYFKYNliIaWqLWkliAxipUs0Ypa2LEuSS3a52x1j-NzaNDW9T9p2HQ02bFOTK4E1KJjBqx2oY0gpWteM0fcUvxsQzd9PDTT7n2b2Yj9KSVPnIg3ap_8CQq6gzuUvqiFnMA</recordid><startdate>20011101</startdate><enddate>20011101</enddate><creator>NAKAYAMA, Shigeyoshi</creator><creator>KIMURA, Atsushi</creator><creator>SHIBATA, Masahiro</creator><creator>KUWABATA, Susumu</creator><creator>OSAKAI, Toshiyuki</creator><general>Electrochemical Society</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SE</scope><scope>8BQ</scope><scope>8FD</scope><scope>H8G</scope><scope>JG9</scope></search><sort><creationdate>20011101</creationdate><title>Voltammetric characterization of oxide films formed on copper in air</title><author>NAKAYAMA, Shigeyoshi ; KIMURA, Atsushi ; SHIBATA, Masahiro ; KUWABATA, Susumu ; OSAKAI, Toshiyuki</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c354t-4b2ecd3b59f843fc721beb6ed4dd18046b453379eac70aad448c64d048cb666a3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2001</creationdate><topic>Chemistry</topic><topic>Electrochemistry</topic><topic>Electrodeposition</topic><topic>Exact sciences and technology</topic><topic>General and physical chemistry</topic><topic>Study of interfaces</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>NAKAYAMA, Shigeyoshi</creatorcontrib><creatorcontrib>KIMURA, Atsushi</creatorcontrib><creatorcontrib>SHIBATA, Masahiro</creatorcontrib><creatorcontrib>KUWABATA, Susumu</creatorcontrib><creatorcontrib>OSAKAI, Toshiyuki</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Corrosion Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Copper Technical Reference Library</collection><collection>Materials Research Database</collection><jtitle>Journal of the Electrochemical Society</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>NAKAYAMA, Shigeyoshi</au><au>KIMURA, Atsushi</au><au>SHIBATA, Masahiro</au><au>KUWABATA, Susumu</au><au>OSAKAI, Toshiyuki</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Voltammetric characterization of oxide films formed on copper in air</atitle><jtitle>Journal of the Electrochemical Society</jtitle><date>2001-11-01</date><risdate>2001</risdate><volume>148</volume><issue>11</issue><spage>B467</spage><epage>B472</epage><pages>B467-B472</pages><issn>0013-4651</issn><eissn>1945-7111</eissn><coden>JESOAN</coden><abstract>Oxide layers thermally formed on copper have been studied using double sweep cyclic voltammetry in strongly alkaline electrolytes. It was found that the addition of 1 M LiOH in an electrolyte (6 M KOH) allowed perfect resolution of cathodic waves due to the reduction of Cu sub 2 O and CuO. Assignment of the two reduction waves has been achieved with the help of spectrophotometric techniques including X-ray photoelectron spectroscopy and X-ray diffraction; the cathodic wave appearing between -1.3 and -1.5 V (vs. Ag/AgCl) was attributed to the reduction of Cu sub 2 O, while that appearing at a less negative potential (-1.0 to -1.1 V) was attributed to the reduction of CuO. The electrochemical measurement of samples prepared under several conditions has revealed that CuO is reduced at once to Cu prior to the reduction of Cu sub 2 O. It was also confirmed that the formation of the oxide films was accelerated by elevating temperature, heightening humidity, and by preimmersion in electrolyte solutions. Water vapor was essential for the formation of CuO at a lower temperature (80 deg C).</abstract><cop>Pennington, NJ</cop><pub>Electrochemical Society</pub><doi>10.1149/1.1409545</doi></addata></record>
fulltext fulltext
identifier ISSN: 0013-4651
ispartof Journal of the Electrochemical Society, 2001-11, Vol.148 (11), p.B467-B472
issn 0013-4651
1945-7111
language eng
recordid cdi_proquest_miscellaneous_27049171
source Institute of Physics Journals
subjects Chemistry
Electrochemistry
Electrodeposition
Exact sciences and technology
General and physical chemistry
Study of interfaces
title Voltammetric characterization of oxide films formed on copper in air
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-03T22%3A04%3A00IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Voltammetric%20characterization%20of%20oxide%20films%20formed%20on%20copper%20in%20air&rft.jtitle=Journal%20of%20the%20Electrochemical%20Society&rft.au=NAKAYAMA,%20Shigeyoshi&rft.date=2001-11-01&rft.volume=148&rft.issue=11&rft.spage=B467&rft.epage=B472&rft.pages=B467-B472&rft.issn=0013-4651&rft.eissn=1945-7111&rft.coden=JESOAN&rft_id=info:doi/10.1149/1.1409545&rft_dat=%3Cproquest_cross%3E27049171%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=27049171&rft_id=info:pmid/&rfr_iscdi=true