Accelerated Diffusion Following Deprotection in Chemically Amplified Resists

Polymeric chemically amplified resists (CARs) are critical materials for high-throughput lithographic processes. A photoactivated acid-anion catalyst changes the polymer’s solubility via a deprotection reaction, which enables pattern development through selective dissolution. To capture observed rea...

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Veröffentlicht in:	The journal of physical chemistry. B 2022-09, Vol.126 (34), p.6562-6574
Hauptverfasser:	Bottoms, Christopher M., Stein, Gila E., Doxastakis, Manolis
Format:	Artikel
Sprache:	eng
Schlagworte:	B: Soft Matter, Fluid Interfaces, Colloids, Polymers, and Glassy Materials
Online-Zugang:	Volltext
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