MgO thin film deposition using TVA (thermoionic vacuum arc)

TVA thin films are obtained as a result of heated cathode discharge established in vacuum condition in the vapours of the material to be deposited. Anode, a tungsten crucible filled with MgO pellets is bombarded by focused thermoelectrons accelerated toward the anode. Due to the incoming energy, MgO...

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Veröffentlicht in:Thin solid films 1999, Vol.343, p.63-66
Hauptverfasser: Ehrich, H., Musa, G., Popescu, A., Mustata, I., Salabas, A., Cretu, M., Leu, G.F.
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container_end_page 66
container_issue
container_start_page 63
container_title Thin solid films
container_volume 343
creator Ehrich, H.
Musa, G.
Popescu, A.
Mustata, I.
Salabas, A.
Cretu, M.
Leu, G.F.
description TVA thin films are obtained as a result of heated cathode discharge established in vacuum condition in the vapours of the material to be deposited. Anode, a tungsten crucible filled with MgO pellets is bombarded by focused thermoelectrons accelerated toward the anode. Due to the incoming energy, MgO starts to evaporate and a discharge is established in the interelectrode space. This new type of evaporation, ensure high quality films due to the bombardment with energetic ions of the own material growing layer.
doi_str_mv 10.1016/S0040-6090(98)01576-4
format Article
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subjects MgO thin film
Plasma assisted deposition
Protecting layer
Thermionic vacuum arc
title MgO thin film deposition using TVA (thermoionic vacuum arc)
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