Study of BCN compounds prepared by the chemical vapor deposition with dimethylamineborane
B-C-N films were synthesized by using the chemical vapor deposition in which the starting material dimethylamineborane was transported onto a substrate with nitrogen gas, and analyzed with secondary electron microscopy, Raman scattering, infrared spectroscopy, x-ray photoelectron spectroscopy, trans...
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Veröffentlicht in: | Journal of materials science 2001-08, Vol.36 (16), p.3925-3931 |
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description | B-C-N films were synthesized by using the chemical vapor deposition in which the starting material dimethylamineborane was transported onto a substrate with nitrogen gas, and analyzed with secondary electron microscopy, Raman scattering, infrared spectroscopy, x-ray photoelectron spectroscopy, transmission electron microscopy, electron diffraction, x-ray diffraction, and ultraviolet-visible-rays absorption spectroscopy. Effects of substrate temperature and deposition pressure on the solid-solutions of B-C-N films were investigated by changing substrate temperature between 700 and 1000 °C under deposition pressure between 100 and 760 Torr. It was found that a mixture of microcrystal glassy carbon and turbostratic-BN both with an apparent crystal size of about 10 Å was deposited under the atmospheric pressure at 1000 °C. In deposition where the pressure was reduced from the atmospheric pressure to 600 Torr, BN gradually lost the stoichiometric compositions to form a mixed structure of BNx (x < 1) and glassy carbon. In deposition where the pressure was lowered than 600 Torr, BNxCy : H (x,y < 1) of which dangling bonds wereterminated with hydrogen was produced as a result of further decrease of the BNx nitriding rate and then substitution of carbon for nitrogen. This BNxCy : H (x,y < 1) showed character close to amorphous material and the composition ratio varied continuously for the deposition pressure change. |
doi_str_mv | 10.1023/A:1017966004367 |
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Effects of substrate temperature and deposition pressure on the solid-solutions of B-C-N films were investigated by changing substrate temperature between 700 and 1000 °C under deposition pressure between 100 and 760 Torr. It was found that a mixture of microcrystal glassy carbon and turbostratic-BN both with an apparent crystal size of about 10 Å was deposited under the atmospheric pressure at 1000 °C. In deposition where the pressure was reduced from the atmospheric pressure to 600 Torr, BN gradually lost the stoichiometric compositions to form a mixed structure of BNx (x < 1) and glassy carbon. In deposition where the pressure was lowered than 600 Torr, BNxCy : H (x,y < 1) of which dangling bonds wereterminated with hydrogen was produced as a result of further decrease of the BNx nitriding rate and then substitution of carbon for nitrogen. This BNxCy : H (x,y < 1) showed character close to amorphous material and the composition ratio varied continuously for the deposition pressure change.</description><identifier>ISSN: 0022-2461</identifier><identifier>EISSN: 1573-4803</identifier><identifier>DOI: 10.1023/A:1017966004367</identifier><identifier>CODEN: JMTSAS</identifier><language>eng</language><publisher>Heidelberg: Springer</publisher><subject>Amorphous materials ; Atmospheric pressure ; Carbon ; Chemical compounds ; Chemical synthesis ; Chemical vapor deposition ; Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) ; Composition ; Cross-disciplinary physics: materials science; rheology ; Electron diffraction ; Exact sciences and technology ; Glassy carbon ; Infrared analysis ; Materials science ; Methods of deposition of films and coatings; film growth and epitaxy ; Microcrystals ; Microscopy ; Nitrogen ; Organic chemistry ; Photoelectrons ; Physics ; Raman spectra ; Solid solutions ; Spectrum analysis ; Substrates ; Transmission electron microscopy ; X ray photoelectron spectroscopy</subject><ispartof>Journal of materials science, 2001-08, Vol.36 (16), p.3925-3931</ispartof><rights>2002 INIST-CNRS</rights><rights>Journal of Materials Science is a copyright of Springer, (2001). All Rights Reserved.</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c319t-b06980761e396eda31a5f37e387fb973f4bb57071df41b5e0a182bc83b564bff3</citedby></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780,27903,27904</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=14066684$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><contributor>WCA</contributor><creatorcontrib>MIENO, Masahiro</creatorcontrib><creatorcontrib>SATOH, Tadao</creatorcontrib><title>Study of BCN compounds prepared by the chemical vapor deposition with dimethylamineborane</title><title>Journal of materials science</title><description>B-C-N films were synthesized by using the chemical vapor deposition in which the starting material dimethylamineborane was transported onto a substrate with nitrogen gas, and analyzed with secondary electron microscopy, Raman scattering, infrared spectroscopy, x-ray photoelectron spectroscopy, transmission electron microscopy, electron diffraction, x-ray diffraction, and ultraviolet-visible-rays absorption spectroscopy. Effects of substrate temperature and deposition pressure on the solid-solutions of B-C-N films were investigated by changing substrate temperature between 700 and 1000 °C under deposition pressure between 100 and 760 Torr. It was found that a mixture of microcrystal glassy carbon and turbostratic-BN both with an apparent crystal size of about 10 Å was deposited under the atmospheric pressure at 1000 °C. In deposition where the pressure was reduced from the atmospheric pressure to 600 Torr, BN gradually lost the stoichiometric compositions to form a mixed structure of BNx (x < 1) and glassy carbon. In deposition where the pressure was lowered than 600 Torr, BNxCy : H (x,y < 1) of which dangling bonds wereterminated with hydrogen was produced as a result of further decrease of the BNx nitriding rate and then substitution of carbon for nitrogen. This BNxCy : H (x,y < 1) showed character close to amorphous material and the composition ratio varied continuously for the deposition pressure change.</description><subject>Amorphous materials</subject><subject>Atmospheric pressure</subject><subject>Carbon</subject><subject>Chemical compounds</subject><subject>Chemical synthesis</subject><subject>Chemical vapor deposition</subject><subject>Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)</subject><subject>Composition</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Electron diffraction</subject><subject>Exact sciences and technology</subject><subject>Glassy carbon</subject><subject>Infrared analysis</subject><subject>Materials science</subject><subject>Methods of deposition of films and coatings; film growth and epitaxy</subject><subject>Microcrystals</subject><subject>Microscopy</subject><subject>Nitrogen</subject><subject>Organic chemistry</subject><subject>Photoelectrons</subject><subject>Physics</subject><subject>Raman spectra</subject><subject>Solid solutions</subject><subject>Spectrum analysis</subject><subject>Substrates</subject><subject>Transmission electron microscopy</subject><subject>X ray photoelectron spectroscopy</subject><issn>0022-2461</issn><issn>1573-4803</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2001</creationdate><recordtype>article</recordtype><sourceid>AFKRA</sourceid><sourceid>BENPR</sourceid><sourceid>CCPQU</sourceid><sourceid>DWQXO</sourceid><recordid>eNqN0M1r3DAQBXARGug26blXQWlvTmYkeWT3tl2aD1iSQ5JDT0ayJVaLbbmWneL_Pobsqaee5vLj8d4w9gXhCkHI6-0PBNQlEYCSpM_YBnMtM1WA_MA2AEJkQhF-ZJ9SOgJArgVu2O-naW4WHj3_uXvgdeyGOPdN4sPoBjO6htuFTwfH64PrQm1a_mqGOPLGDTGFKcSe_w3TgTehc9NhaU0XemfjaHp3yc69aZP7fLoX7OXm1_PuLts_3t7vtvusllhOmQUqC9CETpbkGiPR5F5qJwvtbamlV9bmGjQ2XqHNHRgshK0LaXNS1nt5wb6_5w5j_DO7NFVdSLVr27VDnFMlqNSkkf4HkqKiXOHXf-AxzmO_jqiEIEDMC4BVfTspk9bH-HVzHVI1jKEz41KhAiIqlHwDxlF77g</recordid><startdate>20010815</startdate><enddate>20010815</enddate><creator>MIENO, Masahiro</creator><creator>SATOH, Tadao</creator><general>Springer</general><general>Springer Nature B.V</general><scope>IQODW</scope><scope>8FE</scope><scope>8FG</scope><scope>ABJCF</scope><scope>AFKRA</scope><scope>BENPR</scope><scope>BGLVJ</scope><scope>CCPQU</scope><scope>D1I</scope><scope>DWQXO</scope><scope>HCIFZ</scope><scope>KB.</scope><scope>L6V</scope><scope>M7S</scope><scope>PDBOC</scope><scope>PQEST</scope><scope>PQQKQ</scope><scope>PQUKI</scope><scope>PRINS</scope><scope>PTHSS</scope><scope>7QQ</scope><scope>8FD</scope><scope>JG9</scope><scope>7SP</scope><scope>7SR</scope><scope>8BQ</scope><scope>L7M</scope></search><sort><creationdate>20010815</creationdate><title>Study of BCN compounds prepared by the chemical vapor deposition with dimethylamineborane</title><author>MIENO, Masahiro ; SATOH, Tadao</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c319t-b06980761e396eda31a5f37e387fb973f4bb57071df41b5e0a182bc83b564bff3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2001</creationdate><topic>Amorphous materials</topic><topic>Atmospheric pressure</topic><topic>Carbon</topic><topic>Chemical compounds</topic><topic>Chemical synthesis</topic><topic>Chemical vapor deposition</topic><topic>Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)</topic><topic>Composition</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Electron diffraction</topic><topic>Exact sciences and technology</topic><topic>Glassy carbon</topic><topic>Infrared analysis</topic><topic>Materials science</topic><topic>Methods of deposition of films and coatings; film growth and epitaxy</topic><topic>Microcrystals</topic><topic>Microscopy</topic><topic>Nitrogen</topic><topic>Organic chemistry</topic><topic>Photoelectrons</topic><topic>Physics</topic><topic>Raman spectra</topic><topic>Solid solutions</topic><topic>Spectrum analysis</topic><topic>Substrates</topic><topic>Transmission electron microscopy</topic><topic>X ray photoelectron spectroscopy</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>MIENO, Masahiro</creatorcontrib><creatorcontrib>SATOH, Tadao</creatorcontrib><collection>Pascal-Francis</collection><collection>ProQuest SciTech Collection</collection><collection>ProQuest Technology Collection</collection><collection>Materials Science & Engineering Collection</collection><collection>ProQuest Central UK/Ireland</collection><collection>ProQuest Central</collection><collection>Technology Collection</collection><collection>ProQuest One Community College</collection><collection>ProQuest Materials Science Collection</collection><collection>ProQuest Central Korea</collection><collection>SciTech Premium Collection</collection><collection>Materials Science Database</collection><collection>ProQuest Engineering Collection</collection><collection>Engineering Database</collection><collection>Materials Science Collection</collection><collection>ProQuest One Academic Eastern Edition (DO NOT USE)</collection><collection>ProQuest One Academic</collection><collection>ProQuest One Academic UKI Edition</collection><collection>ProQuest Central China</collection><collection>Engineering Collection</collection><collection>Ceramic Abstracts</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Electronics & Communications Abstracts</collection><collection>Engineered Materials Abstracts</collection><collection>METADEX</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Journal of materials science</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>MIENO, Masahiro</au><au>SATOH, Tadao</au><au>WCA</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Study of BCN compounds prepared by the chemical vapor deposition with dimethylamineborane</atitle><jtitle>Journal of materials science</jtitle><date>2001-08-15</date><risdate>2001</risdate><volume>36</volume><issue>16</issue><spage>3925</spage><epage>3931</epage><pages>3925-3931</pages><issn>0022-2461</issn><eissn>1573-4803</eissn><coden>JMTSAS</coden><abstract>B-C-N films were synthesized by using the chemical vapor deposition in which the starting material dimethylamineborane was transported onto a substrate with nitrogen gas, and analyzed with secondary electron microscopy, Raman scattering, infrared spectroscopy, x-ray photoelectron spectroscopy, transmission electron microscopy, electron diffraction, x-ray diffraction, and ultraviolet-visible-rays absorption spectroscopy. Effects of substrate temperature and deposition pressure on the solid-solutions of B-C-N films were investigated by changing substrate temperature between 700 and 1000 °C under deposition pressure between 100 and 760 Torr. It was found that a mixture of microcrystal glassy carbon and turbostratic-BN both with an apparent crystal size of about 10 Å was deposited under the atmospheric pressure at 1000 °C. In deposition where the pressure was reduced from the atmospheric pressure to 600 Torr, BN gradually lost the stoichiometric compositions to form a mixed structure of BNx (x < 1) and glassy carbon. In deposition where the pressure was lowered than 600 Torr, BNxCy : H (x,y < 1) of which dangling bonds wereterminated with hydrogen was produced as a result of further decrease of the BNx nitriding rate and then substitution of carbon for nitrogen. This BNxCy : H (x,y < 1) showed character close to amorphous material and the composition ratio varied continuously for the deposition pressure change.</abstract><cop>Heidelberg</cop><pub>Springer</pub><doi>10.1023/A:1017966004367</doi><tpages>7</tpages></addata></record> |
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subjects | Amorphous materials Atmospheric pressure Carbon Chemical compounds Chemical synthesis Chemical vapor deposition Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Composition Cross-disciplinary physics: materials science rheology Electron diffraction Exact sciences and technology Glassy carbon Infrared analysis Materials science Methods of deposition of films and coatings film growth and epitaxy Microcrystals Microscopy Nitrogen Organic chemistry Photoelectrons Physics Raman spectra Solid solutions Spectrum analysis Substrates Transmission electron microscopy X ray photoelectron spectroscopy |
title | Study of BCN compounds prepared by the chemical vapor deposition with dimethylamineborane |
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