A gas discharged based radiation source for EUV-lithography

A new high repetitive, compact and low cost gas discharge based EUV “lamp” has been studied as an alternative to laser-produced plasmas as EUV sources. First results using oxygen in a fast discharge of electrically stored energy around 1 J lead to a conversion efficiency of about 0.1 % for the emiss...

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Veröffentlicht in:	Microelectronic engineering 1999, Vol.46 (1), p.449-452
Hauptverfasser:	Lebert, R., Bergmann, K., Schriever, G., Neff, W.
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Electronics Exact sciences and technology Microelectronic fabrication (materials and surfaces technology) Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Online-Zugang:	Volltext
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