Quality of a-Si:H/Si sub(3)N sub(4) multilayer films fabricated by double tubed coaxial line type MPCVD system and application of the films to optical circuit element

The object of this research was the fabrication of high-quality a-Si:H /Si sub(3 )N sub(4) multilayer films with ultrathin multilayered configurations to serve as a new photonic material, as well as the evaluation of the film quality and applications to photonics. The authors have succeeded in contr...

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Veröffentlicht in:	Electronics & communications in Japan. Part 2, Electronics Electronics, 2001-12, Vol.84 (12), p.1-7
Hauptverfasser:	Kato, Isamu, Sagisaka, Masahiko, Sugai, Takayoshi, Kamigaichi, Takeshi
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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