Role of surface states in electrodeposition of Pb on n-Ge(111)
The influence of surface states on the kinetics of the initial stages of Pb electrodeposition on n-Ge(111) was studied by cyclic voltammetric and current transient measurements. The substrate surface was modified to n-Ge(111)H or n-Ge(111)OH applying appropriate experimental and polarization routi...
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creator | Ehlers, C. König, U. Staikov, G. Schultze, J.W. |
description | The influence of surface states on the kinetics of the initial stages of Pb electrodeposition on
n-Ge(111) was studied by cyclic voltammetric and current transient measurements. The substrate surface was modified to
n-Ge(111)H or
n-Ge(111)OH applying appropriate experimental and polarization routines. In transient experiments, the driving force for nucleation, the supersaturation, was varied by both changing the electrode potential
U at
c
Pb
2+
=const and the concentration
c
Pb
2+
at
U=const. The results obtained indicate that, under the experimental conditions used, the nucleation site density
N
0 remains constant with the electrode potential and thus, does not influence the initial nucleation kinetics. The nucleation rate, the density of nucleation sites and the number of atoms
N
crit in critical nuclei were obtained analyzing current transients on the basis of models for instantaneous and progressive nucleation. Nucleation kinetics were found to be more inhibited on
n-Ge(111)OH. The experimental results show that the different nucleation behavior of H- and OH-terminated
n-Ge(111) surfaces can be explained by different densities of Ge
surface free radicals acting as nucleation sites. Problems connected with an application of electrodeposition for metallization of micro- and nanostructures are discussed. |
doi_str_mv | 10.1016/S0013-4686(01)00590-4 |
format | Article |
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n-Ge(111) was studied by cyclic voltammetric and current transient measurements. The substrate surface was modified to
n-Ge(111)H or
n-Ge(111)OH applying appropriate experimental and polarization routines. In transient experiments, the driving force for nucleation, the supersaturation, was varied by both changing the electrode potential
U at
c
Pb
2+
=const and the concentration
c
Pb
2+
at
U=const. The results obtained indicate that, under the experimental conditions used, the nucleation site density
N
0 remains constant with the electrode potential and thus, does not influence the initial nucleation kinetics. The nucleation rate, the density of nucleation sites and the number of atoms
N
crit in critical nuclei were obtained analyzing current transients on the basis of models for instantaneous and progressive nucleation. Nucleation kinetics were found to be more inhibited on
n-Ge(111)OH. The experimental results show that the different nucleation behavior of H- and OH-terminated
n-Ge(111) surfaces can be explained by different densities of Ge
surface free radicals acting as nucleation sites. Problems connected with an application of electrodeposition for metallization of micro- and nanostructures are discussed.</description><identifier>ISSN: 0013-4686</identifier><identifier>EISSN: 1873-3859</identifier><identifier>DOI: 10.1016/S0013-4686(01)00590-4</identifier><identifier>CODEN: ELCAAV</identifier><language>eng</language><publisher>Oxford: Elsevier Ltd</publisher><subject>Applied sciences ; Chemistry ; Electrochemistry ; Electrodeposition ; Exact sciences and technology ; General and physical chemistry ; Germanium ; Metallic coatings ; Metals. Metallurgy ; Nucleation ; Production techniques ; Semiconductors ; Study of interfaces ; Surface states ; Surface treatment</subject><ispartof>Electrochimica acta, 2001-09, Vol.47 (1), p.379-385</ispartof><rights>2001 Elsevier Science Ltd</rights><rights>2002 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c368t-1b976b0cfb676fe0525c19b81e7d6f8f0435b815cc161ed94e401fab64627db23</citedby><cites>FETCH-LOGICAL-c368t-1b976b0cfb676fe0525c19b81e7d6f8f0435b815cc161ed94e401fab64627db23</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://dx.doi.org/10.1016/S0013-4686(01)00590-4$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>309,310,314,780,784,789,790,3550,23930,23931,25140,27924,27925,45995</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=14140052$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Ehlers, C.</creatorcontrib><creatorcontrib>König, U.</creatorcontrib><creatorcontrib>Staikov, G.</creatorcontrib><creatorcontrib>Schultze, J.W.</creatorcontrib><title>Role of surface states in electrodeposition of Pb on n-Ge(111)</title><title>Electrochimica acta</title><description>The influence of surface states on the kinetics of the initial stages of Pb electrodeposition on
n-Ge(111) was studied by cyclic voltammetric and current transient measurements. The substrate surface was modified to
n-Ge(111)H or
n-Ge(111)OH applying appropriate experimental and polarization routines. In transient experiments, the driving force for nucleation, the supersaturation, was varied by both changing the electrode potential
U at
c
Pb
2+
=const and the concentration
c
Pb
2+
at
U=const. The results obtained indicate that, under the experimental conditions used, the nucleation site density
N
0 remains constant with the electrode potential and thus, does not influence the initial nucleation kinetics. The nucleation rate, the density of nucleation sites and the number of atoms
N
crit in critical nuclei were obtained analyzing current transients on the basis of models for instantaneous and progressive nucleation. Nucleation kinetics were found to be more inhibited on
n-Ge(111)OH. The experimental results show that the different nucleation behavior of H- and OH-terminated
n-Ge(111) surfaces can be explained by different densities of Ge
surface free radicals acting as nucleation sites. Problems connected with an application of electrodeposition for metallization of micro- and nanostructures are discussed.</description><subject>Applied sciences</subject><subject>Chemistry</subject><subject>Electrochemistry</subject><subject>Electrodeposition</subject><subject>Exact sciences and technology</subject><subject>General and physical chemistry</subject><subject>Germanium</subject><subject>Metallic coatings</subject><subject>Metals. Metallurgy</subject><subject>Nucleation</subject><subject>Production techniques</subject><subject>Semiconductors</subject><subject>Study of interfaces</subject><subject>Surface states</subject><subject>Surface treatment</subject><issn>0013-4686</issn><issn>1873-3859</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2001</creationdate><recordtype>article</recordtype><recordid>eNqFkEtLw0AQgBdRsFZ_gpCL0h6iM8lmk1yUUrQKBcXHedlsZmElzdbdVPDfm7RFj55mBr55fYydI1whoLh-BcA05qIQE8ApQFZCzA_YCIs8jdMiKw_Z6Bc5ZichfABALnIYsZsX11DkTBQ23ihNUehURyGybUQN6c67mtYu2M66dsCeq6hP2nhBE0ScnrIjo5pAZ_s4Zu_3d2_zh3j5tHicz5axTkXRxViVuahAm0rkwhBkSaaxrAqkvBamMMDTrK8yrVEg1SUnDmhUJbhI8rpK0jG73M1de_e5odDJlQ2amka15DZBJqIEgSX0YLYDtXcheDJy7e1K-W-JIAdbcmtLDiokoNzakrzvu9gvUEGrxnjVahv-mjnyHh0Oud1x1H_7ZcnLoC21mmrre12ydvafTT9PMXv6</recordid><startdate>20010901</startdate><enddate>20010901</enddate><creator>Ehlers, C.</creator><creator>König, U.</creator><creator>Staikov, G.</creator><creator>Schultze, J.W.</creator><general>Elsevier Ltd</general><general>Elsevier</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>7U5</scope><scope>8FD</scope><scope>L7M</scope></search><sort><creationdate>20010901</creationdate><title>Role of surface states in electrodeposition of Pb on n-Ge(111)</title><author>Ehlers, C. ; König, U. ; Staikov, G. ; Schultze, J.W.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c368t-1b976b0cfb676fe0525c19b81e7d6f8f0435b815cc161ed94e401fab64627db23</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2001</creationdate><topic>Applied sciences</topic><topic>Chemistry</topic><topic>Electrochemistry</topic><topic>Electrodeposition</topic><topic>Exact sciences and technology</topic><topic>General and physical chemistry</topic><topic>Germanium</topic><topic>Metallic coatings</topic><topic>Metals. Metallurgy</topic><topic>Nucleation</topic><topic>Production techniques</topic><topic>Semiconductors</topic><topic>Study of interfaces</topic><topic>Surface states</topic><topic>Surface treatment</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Ehlers, C.</creatorcontrib><creatorcontrib>König, U.</creatorcontrib><creatorcontrib>Staikov, G.</creatorcontrib><creatorcontrib>Schultze, J.W.</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Electrochimica acta</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Ehlers, C.</au><au>König, U.</au><au>Staikov, G.</au><au>Schultze, J.W.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Role of surface states in electrodeposition of Pb on n-Ge(111)</atitle><jtitle>Electrochimica acta</jtitle><date>2001-09-01</date><risdate>2001</risdate><volume>47</volume><issue>1</issue><spage>379</spage><epage>385</epage><pages>379-385</pages><issn>0013-4686</issn><eissn>1873-3859</eissn><coden>ELCAAV</coden><abstract>The influence of surface states on the kinetics of the initial stages of Pb electrodeposition on
n-Ge(111) was studied by cyclic voltammetric and current transient measurements. The substrate surface was modified to
n-Ge(111)H or
n-Ge(111)OH applying appropriate experimental and polarization routines. In transient experiments, the driving force for nucleation, the supersaturation, was varied by both changing the electrode potential
U at
c
Pb
2+
=const and the concentration
c
Pb
2+
at
U=const. The results obtained indicate that, under the experimental conditions used, the nucleation site density
N
0 remains constant with the electrode potential and thus, does not influence the initial nucleation kinetics. The nucleation rate, the density of nucleation sites and the number of atoms
N
crit in critical nuclei were obtained analyzing current transients on the basis of models for instantaneous and progressive nucleation. Nucleation kinetics were found to be more inhibited on
n-Ge(111)OH. The experimental results show that the different nucleation behavior of H- and OH-terminated
n-Ge(111) surfaces can be explained by different densities of Ge
surface free radicals acting as nucleation sites. Problems connected with an application of electrodeposition for metallization of micro- and nanostructures are discussed.</abstract><cop>Oxford</cop><pub>Elsevier Ltd</pub><doi>10.1016/S0013-4686(01)00590-4</doi><tpages>7</tpages></addata></record> |
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source | ScienceDirect Journals (5 years ago - present) |
subjects | Applied sciences Chemistry Electrochemistry Electrodeposition Exact sciences and technology General and physical chemistry Germanium Metallic coatings Metals. Metallurgy Nucleation Production techniques Semiconductors Study of interfaces Surface states Surface treatment |
title | Role of surface states in electrodeposition of Pb on n-Ge(111) |
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