Preparation of large uniform amorphous silicon films by VHF-PECVD using a ladder-shaped antenna

We have succeeded in preparing very uniform hydrogenated amorphous Si (a-Si/H) films by VHF plasma CVD at 60 MHz using as an electrode a ladder-shaped antenna. The rf power was applied to eight loading points on the ladder-shaped antenna. In order to supply equal rf power at the each loading point,...

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Veröffentlicht in:	Thin solid films 2001-05, Vol.386 (2), p.133-136
Hauptverfasser:	Takeuchi, Yoshiaki, Nawata, Yoshikazu, Ogawa, Kazuhiko, Serizawa, Akira, Yamauchi, Yasuhiro, Murata, Masayoshi
Format:	Artikel
Sprache:	eng
Schlagworte:	Amorphous Si films Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Cross-disciplinary physics: materials science rheology Deposition Exact sciences and technology Ladder-shaped antenna Materials science Methods of deposition of films and coatings film growth and epitaxy Physics VHF-PECVD
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