Anode mode in cathodic arc deposition apparatus with various cathodes and ambient gases
The anode mode of a vacuum arc in a cathodic arc deposition apparatus was observed as a function of ambient gas pressure ranging from 0.01 to 300 Pa. The chamber (400 mm in diameter and 600 mm in length) made of stainless steel (SUS304) acted as the anode. The arc was operated at a relatively low co...
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Veröffentlicht in: | Thin solid films 2001-06, Vol.390 (1), p.192-196 |
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creator | Miyano, R Saito, T Kimura, K Ikeda, M Takikawa, H Sakakibara, T |
description | The anode mode of a vacuum arc in a cathodic arc deposition apparatus was observed as a function of ambient gas pressure ranging from 0.01 to 300 Pa. The chamber (400 mm in diameter and 600 mm in length) made of stainless steel (SUS304) acted as the anode. The arc was operated at a relatively low constant current of 50 A. The cathode materials used were Al, Ti, Fe, Ni, and Cu, and ambient gases were He, Ne, Ar, H
2, N
2, O
2, and CH
4. The principal results are as follows. (1) As the pressure was increased, the anode mode changed from diffuse-arc to footpoint to plane luminous to anode-spot mode. (2) The anode mode and resultant arc voltage increase were strongly dependent on gas species, and weakly on the cathode material. (3) Comparing diatomic and polyatomic (H
2, N
2, O
2, and CH
4) with mono-atomic molecule gases (He, Ne, and Ar), the onset pressure of the anode mode transition in the former was lower, the arc voltage higher, and the footpoints more numerous, smaller, and clearer. Both the dependence of the ambient pressure and the influence of the cathode materials and gas species on the anode mode changes were explained by the ion deficiency theory. |
doi_str_mv | 10.1016/S0040-6090(01)00918-X |
format | Article |
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2, N
2, O
2, and CH
4. The principal results are as follows. (1) As the pressure was increased, the anode mode changed from diffuse-arc to footpoint to plane luminous to anode-spot mode. (2) The anode mode and resultant arc voltage increase were strongly dependent on gas species, and weakly on the cathode material. (3) Comparing diatomic and polyatomic (H
2, N
2, O
2, and CH
4) with mono-atomic molecule gases (He, Ne, and Ar), the onset pressure of the anode mode transition in the former was lower, the arc voltage higher, and the footpoints more numerous, smaller, and clearer. Both the dependence of the ambient pressure and the influence of the cathode materials and gas species on the anode mode changes were explained by the ion deficiency theory.</description><identifier>ISSN: 0040-6090</identifier><identifier>EISSN: 1879-2731</identifier><identifier>DOI: 10.1016/S0040-6090(01)00918-X</identifier><identifier>CODEN: THSFAP</identifier><language>eng</language><publisher>Lausanne: Elsevier B.V</publisher><subject>Ambient gas ; Anode mode ; Cathode material ; Cathodic arc deposition apparatus ; Cross-disciplinary physics: materials science; rheology ; Exact sciences and technology ; Ion and electron beam-assisted deposition; ion plating ; Materials science ; Methods of deposition of films and coatings; film growth and epitaxy ; Physics ; Physics of gases, plasmas and electric discharges ; Physics of plasmas and electric discharges ; Plasma applications ; Pressure dependence</subject><ispartof>Thin solid films, 2001-06, Vol.390 (1), p.192-196</ispartof><rights>2001 Elsevier Science B.V.</rights><rights>2001 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c367t-3a6193205159a9c34e16e7285205f060435e223e3d5abc7993f39f57914cb7f93</citedby><cites>FETCH-LOGICAL-c367t-3a6193205159a9c34e16e7285205f060435e223e3d5abc7993f39f57914cb7f93</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://www.sciencedirect.com/science/article/pii/S004060900100918X$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>309,310,314,776,780,785,786,3537,23911,23912,25120,27903,27904,65309</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=1027525$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Miyano, R</creatorcontrib><creatorcontrib>Saito, T</creatorcontrib><creatorcontrib>Kimura, K</creatorcontrib><creatorcontrib>Ikeda, M</creatorcontrib><creatorcontrib>Takikawa, H</creatorcontrib><creatorcontrib>Sakakibara, T</creatorcontrib><title>Anode mode in cathodic arc deposition apparatus with various cathodes and ambient gases</title><title>Thin solid films</title><description>The anode mode of a vacuum arc in a cathodic arc deposition apparatus was observed as a function of ambient gas pressure ranging from 0.01 to 300 Pa. The chamber (400 mm in diameter and 600 mm in length) made of stainless steel (SUS304) acted as the anode. The arc was operated at a relatively low constant current of 50 A. The cathode materials used were Al, Ti, Fe, Ni, and Cu, and ambient gases were He, Ne, Ar, H
2, N
2, O
2, and CH
4. The principal results are as follows. (1) As the pressure was increased, the anode mode changed from diffuse-arc to footpoint to plane luminous to anode-spot mode. (2) The anode mode and resultant arc voltage increase were strongly dependent on gas species, and weakly on the cathode material. (3) Comparing diatomic and polyatomic (H
2, N
2, O
2, and CH
4) with mono-atomic molecule gases (He, Ne, and Ar), the onset pressure of the anode mode transition in the former was lower, the arc voltage higher, and the footpoints more numerous, smaller, and clearer. Both the dependence of the ambient pressure and the influence of the cathode materials and gas species on the anode mode changes were explained by the ion deficiency theory.</description><subject>Ambient gas</subject><subject>Anode mode</subject><subject>Cathode material</subject><subject>Cathodic arc deposition apparatus</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Exact sciences and technology</subject><subject>Ion and electron beam-assisted deposition; ion plating</subject><subject>Materials science</subject><subject>Methods of deposition of films and coatings; film growth and epitaxy</subject><subject>Physics</subject><subject>Physics of gases, plasmas and electric discharges</subject><subject>Physics of plasmas and electric discharges</subject><subject>Plasma applications</subject><subject>Pressure dependence</subject><issn>0040-6090</issn><issn>1879-2731</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2001</creationdate><recordtype>article</recordtype><recordid>eNqFkEtLxDAQgIMouD5-gpCDiB6qk6ZpmpMs4gsWPKjoLcymUzey29akKv57s-4i3rzMMOGbRz7GDgScChDl2T1AAVkJBo5BnAAYUWXPG2wkKm2yXEuxyUa_yDbbifEVAESeyxF7GrddTXyxDL7lDodZV3vHMTheU99FP_iu5dj3GHB4j_zTDzP-gcF3qVjhFDm2NcfF1FM78BeMFPfYVoPzSPvrvMsery4fLm6yyd317cV4kjlZ6iGTWAojc1BCGTROFiRK0nml0lMDJRRSUbqTZK1w6rQxspGmUdqIwk11Y-QuO1rN7UP39k5xsAsfHc3n2FK60OZlJStdFQlUK9CFLsZAje2DX2D4sgLsUqP90WiXjiwI-6PRPqe-w_UCjA7nTcDW-finOdcqVwk7X2GUPvvhKdjokg1HtQ_kBlt3_p9F3wfRhfk</recordid><startdate>20010630</startdate><enddate>20010630</enddate><creator>Miyano, R</creator><creator>Saito, T</creator><creator>Kimura, K</creator><creator>Ikeda, M</creator><creator>Takikawa, H</creator><creator>Sakakibara, T</creator><general>Elsevier B.V</general><general>Elsevier Science</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>7U5</scope><scope>8FD</scope><scope>L7M</scope></search><sort><creationdate>20010630</creationdate><title>Anode mode in cathodic arc deposition apparatus with various cathodes and ambient gases</title><author>Miyano, R ; Saito, T ; Kimura, K ; Ikeda, M ; Takikawa, H ; Sakakibara, T</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c367t-3a6193205159a9c34e16e7285205f060435e223e3d5abc7993f39f57914cb7f93</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2001</creationdate><topic>Ambient gas</topic><topic>Anode mode</topic><topic>Cathode material</topic><topic>Cathodic arc deposition apparatus</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Exact sciences and technology</topic><topic>Ion and electron beam-assisted deposition; ion plating</topic><topic>Materials science</topic><topic>Methods of deposition of films and coatings; film growth and epitaxy</topic><topic>Physics</topic><topic>Physics of gases, plasmas and electric discharges</topic><topic>Physics of plasmas and electric discharges</topic><topic>Plasma applications</topic><topic>Pressure dependence</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Miyano, R</creatorcontrib><creatorcontrib>Saito, T</creatorcontrib><creatorcontrib>Kimura, K</creatorcontrib><creatorcontrib>Ikeda, M</creatorcontrib><creatorcontrib>Takikawa, H</creatorcontrib><creatorcontrib>Sakakibara, T</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Thin solid films</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Miyano, R</au><au>Saito, T</au><au>Kimura, K</au><au>Ikeda, M</au><au>Takikawa, H</au><au>Sakakibara, T</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Anode mode in cathodic arc deposition apparatus with various cathodes and ambient gases</atitle><jtitle>Thin solid films</jtitle><date>2001-06-30</date><risdate>2001</risdate><volume>390</volume><issue>1</issue><spage>192</spage><epage>196</epage><pages>192-196</pages><issn>0040-6090</issn><eissn>1879-2731</eissn><coden>THSFAP</coden><abstract>The anode mode of a vacuum arc in a cathodic arc deposition apparatus was observed as a function of ambient gas pressure ranging from 0.01 to 300 Pa. The chamber (400 mm in diameter and 600 mm in length) made of stainless steel (SUS304) acted as the anode. The arc was operated at a relatively low constant current of 50 A. The cathode materials used were Al, Ti, Fe, Ni, and Cu, and ambient gases were He, Ne, Ar, H
2, N
2, O
2, and CH
4. The principal results are as follows. (1) As the pressure was increased, the anode mode changed from diffuse-arc to footpoint to plane luminous to anode-spot mode. (2) The anode mode and resultant arc voltage increase were strongly dependent on gas species, and weakly on the cathode material. (3) Comparing diatomic and polyatomic (H
2, N
2, O
2, and CH
4) with mono-atomic molecule gases (He, Ne, and Ar), the onset pressure of the anode mode transition in the former was lower, the arc voltage higher, and the footpoints more numerous, smaller, and clearer. Both the dependence of the ambient pressure and the influence of the cathode materials and gas species on the anode mode changes were explained by the ion deficiency theory.</abstract><cop>Lausanne</cop><pub>Elsevier B.V</pub><doi>10.1016/S0040-6090(01)00918-X</doi><tpages>5</tpages></addata></record> |
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subjects | Ambient gas Anode mode Cathode material Cathodic arc deposition apparatus Cross-disciplinary physics: materials science rheology Exact sciences and technology Ion and electron beam-assisted deposition ion plating Materials science Methods of deposition of films and coatings film growth and epitaxy Physics Physics of gases, plasmas and electric discharges Physics of plasmas and electric discharges Plasma applications Pressure dependence |
title | Anode mode in cathodic arc deposition apparatus with various cathodes and ambient gases |
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