The chemical and morphological properties of boron-carbon alloys grown by plasma-enhanced chemical vapour deposition

The stoichiometry and morphology of boron–carbon alloy thin films grown by plasma-enhanced chemical vapour deposition can be significantly modified by varying the deposition rate. Films grown at a rate of 5.5 nm min−1 are characterized by an amorphous-like matrix with carbon-rich and dome-like inclu...

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Veröffentlicht in:	Journal of materials science 1998-10, Vol.33 (20), p.4911-4915
Hauptverfasser:	ZHANG, D, MCILROY, D. N, O'BRIEN, W. L, DE STASIO, G
Format:	Artikel
Sprache:	eng
Schlagworte:	Absorption spectra Boron Boron alloys Carbon Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Composition and phase identification Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology Domes Exact sciences and technology Excitation Inclusions Materials science Methods of deposition of films and coatings film growth and epitaxy Morphology Organic chemistry Physics Plasma enhanced chemical vapor deposition Stoichiometry Structure and morphology thickness Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Thin film structure and morphology Thin films
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