The chemical and morphological properties of boron-carbon alloys grown by plasma-enhanced chemical vapour deposition
The stoichiometry and morphology of boron–carbon alloy thin films grown by plasma-enhanced chemical vapour deposition can be significantly modified by varying the deposition rate. Films grown at a rate of 5.5 nm min−1 are characterized by an amorphous-like matrix with carbon-rich and dome-like inclu...
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| Veröffentlicht in: | Journal of materials science 1998-10, Vol.33 (20), p.4911-4915 |
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| container_end_page | 4915 |
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| container_issue | 20 |
| container_start_page | 4911 |
| container_title | Journal of materials science |
| container_volume | 33 |
| creator | ZHANG, D MCILROY, D. N O'BRIEN, W. L DE STASIO, G |
| description | The stoichiometry and morphology of boron–carbon alloy thin films grown by plasma-enhanced chemical vapour deposition can be significantly modified by varying the deposition rate. Films grown at a rate of 5.5 nm min−1 are characterized by an amorphous-like matrix with carbon-rich and dome-like inclusions. Films grown at a deposition rate of 33 nm min−1 are found to be much more homogeneous and free of carbon-rich and dome-like inclusions. An excitation at 191.7 eV in the B 1s absorption spectrum has been associated with amorphous growth. The relative intensities of the π* and σ* excitations across the C 1s absorption edge of these boron-carbon alloys indicate that carbon bonding is predominantly through sp3 hybridization, while boron bonding is a mix of sp2 and sp3 hybridization. |
| doi_str_mv | 10.1023/A:1004422016254 |
| format | Article |
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The relative intensities of the π* and σ* excitations across the C 1s absorption edge of these boron-carbon alloys indicate that carbon bonding is predominantly through sp3 hybridization, while boron bonding is a mix of sp2 and sp3 hybridization.</description><identifier>ISSN: 0022-2461</identifier><identifier>EISSN: 1573-4803</identifier><identifier>DOI: 10.1023/A:1004422016254</identifier><identifier>CODEN: JMTSAS</identifier><language>eng</language><publisher>Heidelberg: Springer</publisher><subject>Absorption spectra ; Boron ; Boron alloys ; Carbon ; Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) ; Composition and phase identification ; Condensed matter: structure, mechanical and thermal properties ; Cross-disciplinary physics: materials science; rheology ; Domes ; Exact sciences and technology ; Excitation ; Inclusions ; Materials science ; Methods of deposition of films and coatings; film growth and epitaxy ; Morphology ; Organic chemistry ; Physics ; Plasma enhanced chemical vapor deposition ; Stoichiometry ; Structure and morphology; thickness ; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) ; Thin film structure and morphology ; Thin films</subject><ispartof>Journal of materials science, 1998-10, Vol.33 (20), p.4911-4915</ispartof><rights>1999 INIST-CNRS</rights><rights>Journal of Materials Science is a copyright of Springer, (1998). 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L ; DE STASIO, G</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c287t-5fe73dc34e8a43926cd4e39d3a45faaa7365ee391016eb2ced44e01ebb5da8653</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1998</creationdate><topic>Absorption spectra</topic><topic>Boron</topic><topic>Boron alloys</topic><topic>Carbon</topic><topic>Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)</topic><topic>Composition and phase identification</topic><topic>Condensed matter: structure, mechanical and thermal properties</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Domes</topic><topic>Exact sciences and technology</topic><topic>Excitation</topic><topic>Inclusions</topic><topic>Materials science</topic><topic>Methods of deposition of films and coatings; film growth and epitaxy</topic><topic>Morphology</topic><topic>Organic chemistry</topic><topic>Physics</topic><topic>Plasma enhanced chemical vapor deposition</topic><topic>Stoichiometry</topic><topic>Structure and morphology; thickness</topic><topic>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</topic><topic>Thin film structure and morphology</topic><topic>Thin films</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>ZHANG, D</creatorcontrib><creatorcontrib>MCILROY, D. 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N</au><au>O'BRIEN, W. L</au><au>DE STASIO, G</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>The chemical and morphological properties of boron-carbon alloys grown by plasma-enhanced chemical vapour deposition</atitle><jtitle>Journal of materials science</jtitle><date>1998-10-15</date><risdate>1998</risdate><volume>33</volume><issue>20</issue><spage>4911</spage><epage>4915</epage><pages>4911-4915</pages><issn>0022-2461</issn><eissn>1573-4803</eissn><coden>JMTSAS</coden><abstract>The stoichiometry and morphology of boron–carbon alloy thin films grown by plasma-enhanced chemical vapour deposition can be significantly modified by varying the deposition rate. Films grown at a rate of 5.5 nm min−1 are characterized by an amorphous-like matrix with carbon-rich and dome-like inclusions. Films grown at a deposition rate of 33 nm min−1 are found to be much more homogeneous and free of carbon-rich and dome-like inclusions. An excitation at 191.7 eV in the B 1s absorption spectrum has been associated with amorphous growth. The relative intensities of the π* and σ* excitations across the C 1s absorption edge of these boron-carbon alloys indicate that carbon bonding is predominantly through sp3 hybridization, while boron bonding is a mix of sp2 and sp3 hybridization.</abstract><cop>Heidelberg</cop><pub>Springer</pub><doi>10.1023/A:1004422016254</doi><tpages>5</tpages></addata></record> |
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| ispartof | Journal of materials science, 1998-10, Vol.33 (20), p.4911-4915 |
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| subjects | Absorption spectra Boron Boron alloys Carbon Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Composition and phase identification Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology Domes Exact sciences and technology Excitation Inclusions Materials science Methods of deposition of films and coatings film growth and epitaxy Morphology Organic chemistry Physics Plasma enhanced chemical vapor deposition Stoichiometry Structure and morphology thickness Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Thin film structure and morphology Thin films |
| title | The chemical and morphological properties of boron-carbon alloys grown by plasma-enhanced chemical vapour deposition |
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