Role of surface features in CVD diamond nucleation on surface-pretreated substrates
The role of substrate pretreatments in the nucleation of CVD diamond on non-diamond substrates is not clearly understood. The CVD diamond nucleation on polished Si(100) pretreated with ultrasonication and patterned Si(100) without and with the identical pretreatment was studied. It was concluded tha...
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| Veröffentlicht in: | Materials letters 1998, Vol.34 (3), p.387-391 |
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| container_title | Materials letters |
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| creator | Karve, Priyadarshini Sainkar, S.R Kshirsagar, S.T |
| description | The role of substrate pretreatments in the nucleation of CVD diamond on non-diamond substrates is not clearly understood. The CVD diamond nucleation on polished Si(100) pretreated with ultrasonication and patterned Si(100) without and with the identical pretreatment was studied. It was concluded that nucleation on pretreated surfaces occurs predominantly on the diamond residue, but the surface features produced play an important role as traps for diamond particulates during pretreatment, leading to more effective diamond seeding. |
| doi_str_mv | 10.1016/S0167-577X(97)00208-5 |
| format | Article |
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The CVD diamond nucleation on polished Si(100) pretreated with ultrasonication and patterned Si(100) without and with the identical pretreatment was studied. It was concluded that nucleation on pretreated surfaces occurs predominantly on the diamond residue, but the surface features produced play an important role as traps for diamond particulates during pretreatment, leading to more effective diamond seeding.</description><identifier>ISSN: 0167-577X</identifier><identifier>EISSN: 1873-4979</identifier><identifier>DOI: 10.1016/S0167-577X(97)00208-5</identifier><identifier>CODEN: MLETDJ</identifier><language>eng</language><publisher>Amsterdam: Elsevier B.V</publisher><subject>Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) ; Cross-disciplinary physics: materials science; rheology ; CVD diamond ; Diamond residue ; Exact sciences and technology ; Materials science ; Methods of deposition of films and coatings; film growth and epitaxy ; Physics ; Si substrate diamond nucleation ; Surface features ; Surface pretreatments</subject><ispartof>Materials letters, 1998, Vol.34 (3), p.387-391</ispartof><rights>1998 Elsevier Science B.V.</rights><rights>1998 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c367t-74027235e24f2de3f472691dc6839b3f98227f4fe68bf53988afd34c4a29988d3</citedby><cites>FETCH-LOGICAL-c367t-74027235e24f2de3f472691dc6839b3f98227f4fe68bf53988afd34c4a29988d3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://dx.doi.org/10.1016/S0167-577X(97)00208-5$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>314,780,784,3548,4021,27921,27922,27923,45993</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=2216254$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><contributor>WCA</contributor><creatorcontrib>Karve, Priyadarshini</creatorcontrib><creatorcontrib>Sainkar, S.R</creatorcontrib><creatorcontrib>Kshirsagar, S.T</creatorcontrib><title>Role of surface features in CVD diamond nucleation on surface-pretreated substrates</title><title>Materials letters</title><description>The role of substrate pretreatments in the nucleation of CVD diamond on non-diamond substrates is not clearly understood. The CVD diamond nucleation on polished Si(100) pretreated with ultrasonication and patterned Si(100) without and with the identical pretreatment was studied. 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The CVD diamond nucleation on polished Si(100) pretreated with ultrasonication and patterned Si(100) without and with the identical pretreatment was studied. It was concluded that nucleation on pretreated surfaces occurs predominantly on the diamond residue, but the surface features produced play an important role as traps for diamond particulates during pretreatment, leading to more effective diamond seeding.</abstract><cop>Amsterdam</cop><pub>Elsevier B.V</pub><doi>10.1016/S0167-577X(97)00208-5</doi><tpages>5</tpages></addata></record> |
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| identifier | ISSN: 0167-577X |
| ispartof | Materials letters, 1998, Vol.34 (3), p.387-391 |
| issn | 0167-577X 1873-4979 |
| language | eng |
| recordid | cdi_proquest_miscellaneous_26738514 |
| source | ScienceDirect Journals (5 years ago - present) |
| subjects | Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Cross-disciplinary physics: materials science rheology CVD diamond Diamond residue Exact sciences and technology Materials science Methods of deposition of films and coatings film growth and epitaxy Physics Si substrate diamond nucleation Surface features Surface pretreatments |
| title | Role of surface features in CVD diamond nucleation on surface-pretreated substrates |
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