Effect of process variables on the structure, residual stress, and hardness of sputtered nanocrystalline nickel films

Nanocrystalline nickel films of about 0.1 μm thickness grown by sputtering with and without substrate bias possessed average grain sizes of 9–25 nm. Variation in substrate bias at room and liquid nitrogen temperature of deposition strongly affected grain structure and size distribution. Qualitative...

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Veröffentlicht in:	Journal of materials research 2001-04, Vol.16 (4), p.1010-1027
Hauptverfasser:	Mitra, R., Hoffman, R. A., Madan, A., Weertman, J. R.
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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