Incorporation of ZrO2 into MoSi2 Porous Bodies by Chemical Vapour Infiltration

Incorporation of ZrO2 into MoSi2 Porous Bodies by Chemical Vapour Infiltration

Incorporation of ZrO2 has been shown to strengthen MoSi2 at room temperature. ZrO2 was incorporated into MoSi2 partially sintered bodies by means of CVI. An organometallic precursor was used to fill the fine pore network. Infiltration kinetics were studied by observing the infiltrated microstructure...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Key engineering materials 1999-01, Vol.161-163, p.275-278
Hauptverfasser: Kikuchi, A., Taniguchi, Satiyo, Yoshikawa, Nobuhiro
Format: Artikel
Sprache:eng
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page 278
container_issue
container_start_page 275
container_title Key engineering materials
container_volume 161-163
creator Kikuchi, A.
Taniguchi, Satiyo
Yoshikawa, Nobuhiro
description Incorporation of ZrO2 has been shown to strengthen MoSi2 at room temperature. ZrO2 was incorporated into MoSi2 partially sintered bodies by means of CVI. An organometallic precursor was used to fill the fine pore network. Infiltration kinetics were studied by observing the infiltrated microstructures under different conditions, and the infiltrated distance was estimated using a one-dimensional analytical model, and it was possible to explain the experimental result at 2.6 kPa. Infiltration temperature of 673K resulted in low crystallinity of the deposited ZrO2, and post annealing treatment was conducted. Microstructural changes were observed by TEM. Optimum conditions for fabricating MoSi2/ZrO2 by CVI are discussed, taking account of the obtained results. 4 refs.
doi_str_mv 10.4028/www.scientific.net/KEM.161-163.275
format Article
fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_26658836</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>26658836</sourcerecordid><originalsourceid>FETCH-LOGICAL-c301t-937ac4f06d77fc2a3753f3b0048aa6d516e9c36abe8a7f189192faaf7d63b2103</originalsourceid><addsrcrecordid>eNqVkE1LAzEURQdRsFb_Q1YuhJnmo5PJLG2tWmyt4MfCTchkEpoyTcYkpfTfG6ng2sXjvcXl8O7JshsEizHEbLTf74sgjbLRaCMLq-LoabYsEEU5oqTAVXmSDRClOK-rujxNN0Qkrxmm59lFCBsICWKoHGTPcyud750X0TgLnAaffoWBsdGBpXs1GLw473YBTFxrVADNAUzXamuk6MCH6N3Og7nVpotHwGV2pkUX1NXvHmbv97O36WO-WD3Mp7eLXBKIYl6TSsixhrStKi2xIFVJNGkgHDMhaFsiqmpJqGgUE5VGrEY11kLoqqWkwQiSYXZ95Pbefe1UiHxrglRdJ6xK33JMackYoSk4OQaldyF4pXnvzVb4A0eQ_6jkSSX_U8mTSp5U8qQyDeFJZYLcHSGppQ1RyTXfpOY2NfwP5hsvPodO</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>26658836</pqid></control><display><type>article</type><title>Incorporation of ZrO2 into MoSi2 Porous Bodies by Chemical Vapour Infiltration</title><source>Scientific.net Journals</source><creator>Kikuchi, A. ; Taniguchi, Satiyo ; Yoshikawa, Nobuhiro</creator><contributor>WCA</contributor><creatorcontrib>Kikuchi, A. ; Taniguchi, Satiyo ; Yoshikawa, Nobuhiro ; WCA</creatorcontrib><description>Incorporation of ZrO2 has been shown to strengthen MoSi2 at room temperature. ZrO2 was incorporated into MoSi2 partially sintered bodies by means of CVI. An organometallic precursor was used to fill the fine pore network. Infiltration kinetics were studied by observing the infiltrated microstructures under different conditions, and the infiltrated distance was estimated using a one-dimensional analytical model, and it was possible to explain the experimental result at 2.6 kPa. Infiltration temperature of 673K resulted in low crystallinity of the deposited ZrO2, and post annealing treatment was conducted. Microstructural changes were observed by TEM. Optimum conditions for fabricating MoSi2/ZrO2 by CVI are discussed, taking account of the obtained results. 4 refs.</description><identifier>ISSN: 1013-9826</identifier><identifier>ISSN: 1662-9795</identifier><identifier>EISSN: 1662-9795</identifier><identifier>DOI: 10.4028/www.scientific.net/KEM.161-163.275</identifier><language>eng</language><publisher>Trans Tech Publications Ltd</publisher><ispartof>Key engineering materials, 1999-01, Vol.161-163, p.275-278</ispartof><rights>1999 Trans Tech Publications Ltd</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c301t-937ac4f06d77fc2a3753f3b0048aa6d516e9c36abe8a7f189192faaf7d63b2103</citedby></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Uhttps://www.scientific.net/Image/TitleCover/372?width=600</thumbnail><link.rule.ids>314,780,784,27924,27925</link.rule.ids></links><search><contributor>WCA</contributor><creatorcontrib>Kikuchi, A.</creatorcontrib><creatorcontrib>Taniguchi, Satiyo</creatorcontrib><creatorcontrib>Yoshikawa, Nobuhiro</creatorcontrib><title>Incorporation of ZrO2 into MoSi2 Porous Bodies by Chemical Vapour Infiltration</title><title>Key engineering materials</title><description>Incorporation of ZrO2 has been shown to strengthen MoSi2 at room temperature. ZrO2 was incorporated into MoSi2 partially sintered bodies by means of CVI. An organometallic precursor was used to fill the fine pore network. Infiltration kinetics were studied by observing the infiltrated microstructures under different conditions, and the infiltrated distance was estimated using a one-dimensional analytical model, and it was possible to explain the experimental result at 2.6 kPa. Infiltration temperature of 673K resulted in low crystallinity of the deposited ZrO2, and post annealing treatment was conducted. Microstructural changes were observed by TEM. Optimum conditions for fabricating MoSi2/ZrO2 by CVI are discussed, taking account of the obtained results. 4 refs.</description><issn>1013-9826</issn><issn>1662-9795</issn><issn>1662-9795</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1999</creationdate><recordtype>article</recordtype><recordid>eNqVkE1LAzEURQdRsFb_Q1YuhJnmo5PJLG2tWmyt4MfCTchkEpoyTcYkpfTfG6ng2sXjvcXl8O7JshsEizHEbLTf74sgjbLRaCMLq-LoabYsEEU5oqTAVXmSDRClOK-rujxNN0Qkrxmm59lFCBsICWKoHGTPcyud750X0TgLnAaffoWBsdGBpXs1GLw473YBTFxrVADNAUzXamuk6MCH6N3Og7nVpotHwGV2pkUX1NXvHmbv97O36WO-WD3Mp7eLXBKIYl6TSsixhrStKi2xIFVJNGkgHDMhaFsiqmpJqGgUE5VGrEY11kLoqqWkwQiSYXZ95Pbefe1UiHxrglRdJ6xK33JMackYoSk4OQaldyF4pXnvzVb4A0eQ_6jkSSX_U8mTSp5U8qQyDeFJZYLcHSGppQ1RyTXfpOY2NfwP5hsvPodO</recordid><startdate>19990101</startdate><enddate>19990101</enddate><creator>Kikuchi, A.</creator><creator>Taniguchi, Satiyo</creator><creator>Yoshikawa, Nobuhiro</creator><general>Trans Tech Publications Ltd</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7QQ</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>19990101</creationdate><title>Incorporation of ZrO2 into MoSi2 Porous Bodies by Chemical Vapour Infiltration</title><author>Kikuchi, A. ; Taniguchi, Satiyo ; Yoshikawa, Nobuhiro</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c301t-937ac4f06d77fc2a3753f3b0048aa6d516e9c36abe8a7f189192faaf7d63b2103</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1999</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Kikuchi, A.</creatorcontrib><creatorcontrib>Taniguchi, Satiyo</creatorcontrib><creatorcontrib>Yoshikawa, Nobuhiro</creatorcontrib><collection>CrossRef</collection><collection>Ceramic Abstracts</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Key engineering materials</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Kikuchi, A.</au><au>Taniguchi, Satiyo</au><au>Yoshikawa, Nobuhiro</au><au>WCA</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Incorporation of ZrO2 into MoSi2 Porous Bodies by Chemical Vapour Infiltration</atitle><jtitle>Key engineering materials</jtitle><date>1999-01-01</date><risdate>1999</risdate><volume>161-163</volume><spage>275</spage><epage>278</epage><pages>275-278</pages><issn>1013-9826</issn><issn>1662-9795</issn><eissn>1662-9795</eissn><abstract>Incorporation of ZrO2 has been shown to strengthen MoSi2 at room temperature. ZrO2 was incorporated into MoSi2 partially sintered bodies by means of CVI. An organometallic precursor was used to fill the fine pore network. Infiltration kinetics were studied by observing the infiltrated microstructures under different conditions, and the infiltrated distance was estimated using a one-dimensional analytical model, and it was possible to explain the experimental result at 2.6 kPa. Infiltration temperature of 673K resulted in low crystallinity of the deposited ZrO2, and post annealing treatment was conducted. Microstructural changes were observed by TEM. Optimum conditions for fabricating MoSi2/ZrO2 by CVI are discussed, taking account of the obtained results. 4 refs.</abstract><pub>Trans Tech Publications Ltd</pub><doi>10.4028/www.scientific.net/KEM.161-163.275</doi><tpages>4</tpages></addata></record>
fulltext fulltext
identifier ISSN: 1013-9826
ispartof Key engineering materials, 1999-01, Vol.161-163, p.275-278
issn 1013-9826
1662-9795
1662-9795
language eng
recordid cdi_proquest_miscellaneous_26658836
source Scientific.net Journals
title Incorporation of ZrO2 into MoSi2 Porous Bodies by Chemical Vapour Infiltration
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-29T21%3A07%3A06IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Incorporation%20of%20ZrO2%20into%20MoSi2%20Porous%20Bodies%20by%20Chemical%20Vapour%20Infiltration&rft.jtitle=Key%20engineering%20materials&rft.au=Kikuchi,%20A.&rft.date=1999-01-01&rft.volume=161-163&rft.spage=275&rft.epage=278&rft.pages=275-278&rft.issn=1013-9826&rft.eissn=1662-9795&rft_id=info:doi/10.4028/www.scientific.net/KEM.161-163.275&rft_dat=%3Cproquest_cross%3E26658836%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=26658836&rft_id=info:pmid/&rfr_iscdi=true