Bolometric characteristics of macroporous silicon structures
Bolometric characteristics of macroporous silicon were investigated. Ohmic structures of the type dn/n-Si and dn /macroporous n-Si were formed by thermal evaporation of indium in a hydrogen atmosphere. Temperature dependencies of electron conductivity, concentration and mobility in macroporous silic...
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Veröffentlicht in: | Semiconductor physics, quantum electronics, and optoelectronics quantum electronics, and optoelectronics, 2001-07, Vol.4 (3), p.177-181 |
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description | Bolometric characteristics of macroporous silicon were investigated. Ohmic structures of the type dn/n-Si and dn /macroporous n-Si were formed by thermal evaporation of indium in a hydrogen atmosphere. Temperature dependencies of electron conductivity, concentration and mobility in macroporous silicon emulate the temperature curves of the corresponding parameters for crystalline silicon. The investigated macroporous silicon structures are promising material for multi-element thermal sensor fabrication due to their high temperature coefficient of electrical resistance, low noise level and good radiation absorption in the operation spectral region. (Author) |
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Ohmic structures of the type dn/n-Si and dn /macroporous n-Si were formed by thermal evaporation of indium in a hydrogen atmosphere. Temperature dependencies of electron conductivity, concentration and mobility in macroporous silicon emulate the temperature curves of the corresponding parameters for crystalline silicon. The investigated macroporous silicon structures are promising material for multi-element thermal sensor fabrication due to their high temperature coefficient of electrical resistance, low noise level and good radiation absorption in the operation spectral region. 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Ohmic structures of the type dn/n-Si and dn /macroporous n-Si were formed by thermal evaporation of indium in a hydrogen atmosphere. Temperature dependencies of electron conductivity, concentration and mobility in macroporous silicon emulate the temperature curves of the corresponding parameters for crystalline silicon. The investigated macroporous silicon structures are promising material for multi-element thermal sensor fabrication due to their high temperature coefficient of electrical resistance, low noise level and good radiation absorption in the operation spectral region. 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Ohmic structures of the type dn/n-Si and dn /macroporous n-Si were formed by thermal evaporation of indium in a hydrogen atmosphere. Temperature dependencies of electron conductivity, concentration and mobility in macroporous silicon emulate the temperature curves of the corresponding parameters for crystalline silicon. The investigated macroporous silicon structures are promising material for multi-element thermal sensor fabrication due to their high temperature coefficient of electrical resistance, low noise level and good radiation absorption in the operation spectral region. (Author)</abstract><doi>10.15407/spqeo4.03.177</doi><tpages>5</tpages><oa>free_for_read</oa></addata></record> |
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title | Bolometric characteristics of macroporous silicon structures |
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