Structure and performance of Si/Mo multilayer mirrors for the extreme ultraviolet

We report the results of structural, chemical, and extreme ultraviolet (EUV) characterization of Si/Mo multilayers grown by sputtering and by UHV evaporation. This study includes mirrors designed for normal incidence with peak reflectivities Rpeak between 22 and 24 nm, and 45° mirrors having Rpeak b...

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Veröffentlicht in:	Journal of applied physics 1994-08, Vol.76 (4), p.2144-2156
Hauptverfasser:	Slaughter, J. M., Schulze, Dean W., Hills, C. R., Mirone, A., Stalio, R., Watts, R. N., Tarrio, C., Lucatorto, T. B., Krumrey, M., Mueller, P., Falco, Charles M.
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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