Laser removal of oxides from a copper substrate using Q-switched Nd:YAG radiation at 1064, 532 and 266 nm

The objective of the work reported is to study the effect of wavelength and the material removal mechanisms of a laser process for removing copper oxide from copper. The removal of copper oxide is necessary in electronics device fabrication in order to improve the surface wetability and so achieve a...

Ausführliche Beschreibung

Bibliographische Detailangaben

Veröffentlicht in:	Applied surface science 1997-07, Vol.127-129, p.773-780
Hauptverfasser:	Kearns, A, Fischer, C, Watkins, K G, Glasmacher, M, Kheyrandish, H, Brown, A, Steen, W M, Beahan, P
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!