Plasma etch mechanistic framework used for tribochemical reactions

The mechanistic framework, previously used for plasma etching can also be applied to tribochemical processes. Although the impact processes in plasma etching are on an atomic scale with high impact energies and in tribochemistry are on a monoscopic scale with often much lower impact energies, in both cases the individual reaction steps may be considered as being thermally activated and mechanically parellel (independent of temperature). For both types of processes a lowered activation energy for the thermally activated path during impact has been observed.