Depth Profiles of Al/Mn/Si Multilayers
An electron scattering model called IntriX associated to electron X-ray emission spectrometry (EXES) at high resolution is tested to characterize stratified samples. The ability of the model to simulate the X-ray intensity emitted by a surface layer and a buried layer in film/substrate systems is il...
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| Veröffentlicht in: | Microscopy microanalysis microstructures (Les Ulis) 1997-08, Vol.8 (4-5), p.287-300 |
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| container_issue | 4-5 |
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| container_title | Microscopy microanalysis microstructures (Les Ulis) |
| container_volume | 8 |
| creator | Hombourger, Chrystel Jonnard, Philippe Bonnelle, Christiane Beauprez, Eric Spirckel, Marc Feltz, Béatrice Boutard, Dominique Gallien, Jean-Paul |
| description | An electron scattering model called IntriX associated to electron X-ray emission spectrometry (EXES) at high resolution is tested to characterize stratified samples. The ability of the model to simulate the X-ray intensity emitted by a surface layer and a buried layer in film/substrate systems is illustrated. The characterization of Al/Mn/Si multilayers by means of non destructive techniques (electron probe microanalysis (EPMA), Rutherford back scattering (RBS)) have been performed comparatively to the EXES measurements. The potentialities of the IntriX model combined to EXES to predict thicknesses is established by comparison with EPMA and RBS results. |
| doi_str_mv | 10.1051/mmm:1997122 |
| format | Article |
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The ability of the model to simulate the X-ray intensity emitted by a surface layer and a buried layer in film/substrate systems is illustrated. The characterization of Al/Mn/Si multilayers by means of non destructive techniques (electron probe microanalysis (EPMA), Rutherford back scattering (RBS)) have been performed comparatively to the EXES measurements. The potentialities of the IntriX model combined to EXES to predict thicknesses is established by comparison with EPMA and RBS results.</description><subject>6865</subject><subject>7870E</subject><subject>7920N</subject><subject>8280</subject><subject>Al Mn Si</subject><subject>Al Mn Si multilayers</subject><subject>aluminium</subject><subject>buried layer</subject><subject>buried layers</subject><subject>characterization</subject><subject>depth profiles</subject><subject>electron probe analysis</subject><subject>electron probe microanalysis</subject><subject>electron scattering model</subject><subject>electron X ray emission spectrometry</subject><subject>EPMA</subject><subject>film substrate systems</subject><subject>high resolution</subject><subject>IntriX</subject><subject>manganese</subject><subject>metallic superlattices</subject><subject>nondestructive techniques</subject><subject>RBS</subject><subject>Rutherford backscattering</subject><subject>semiconductor metal boundaries</subject><subject>silicon</subject><subject>stratified samples</subject><subject>surface layer</subject><subject>thicknesses</subject><subject>X ray emission spectra</subject><subject>X ray intensity</subject><issn>1154-2799</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1997</creationdate><recordtype>article</recordtype><recordid>eNo9z89LwzAYxvEcFJzTk_9AT7tIXd6kSRpvY_4cGw5Uegxp-har6TqTDtx_b2XD03P58MCXkCugN0AFTNu2vQWtFTB2QkYAIkuZ0vqMnMf4SSlILmBEJne47T-SdejqxmNMujqZ-elqM31tktXO9423ewzxgpzW1ke8PO6YvD_cv82f0uXL4_N8tkwd56pPmWXIrGRZyctcO1tqCVCW2kldIuaK5hVYV1GhcyF5prUTqKhEripgtrJ8TCaH323ovncYe9M20aH3doPdLhomBWRayQFeH6ALXYwBa7MNTWvD3gA1f_1m6DfH_kGnB93EHn_-qQ1fRiquhMlpYQpJV8VysTYL_guOU11r</recordid><startdate>19970801</startdate><enddate>19970801</enddate><creator>Hombourger, Chrystel</creator><creator>Jonnard, Philippe</creator><creator>Bonnelle, Christiane</creator><creator>Beauprez, Eric</creator><creator>Spirckel, Marc</creator><creator>Feltz, Béatrice</creator><creator>Boutard, Dominique</creator><creator>Gallien, Jean-Paul</creator><general>EDP Sciences</general><scope>BSCLL</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7QF</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>19970801</creationdate><title>Depth Profiles of Al/Mn/Si Multilayers</title><author>Hombourger, Chrystel ; 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| subjects | 6865 7870E 7920N 8280 Al Mn Si Al Mn Si multilayers aluminium buried layer buried layers characterization depth profiles electron probe analysis electron probe microanalysis electron scattering model electron X ray emission spectrometry EPMA film substrate systems high resolution IntriX manganese metallic superlattices nondestructive techniques RBS Rutherford backscattering semiconductor metal boundaries silicon stratified samples surface layer thicknesses X ray emission spectra X ray intensity |
| title | Depth Profiles of Al/Mn/Si Multilayers |
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