Interaction of chlorine with Si (100) 2x 1 studied using soft x-ray photoemission and photon stimulated ion desorption

Interaction of chlorine with Si (100) 2x 1 studied using soft x-ray photoemission and photon stimulated ion desorption

Chlorine adsorption on Si(100)2x1 at 295 K and 473 plus or minus 50 K has been investigated using Si2p soft X-ray photoemission and photon stimulated ion desorption (PSID) at the SiL sub(2,3) edge. The photoemission results indicate that both monochloride and dichloride species are formed, with a ra...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Surface science 1994-01, Vol.307-09, p.269-273
Hauptverfasser: Sterratt, D, Greenwood, C L, Williams, E M, Muryn, C A, Wincott, P L, Thornton, G, Roman, E
Format: Artikel
Sprache:eng
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Chlorine adsorption on Si(100)2x1 at 295 K and 473 plus or minus 50 K has been investigated using Si2p soft X-ray photoemission and photon stimulated ion desorption (PSID) at the SiL sub(2,3) edge. The photoemission results indicate that both monochloride and dichloride species are formed, with a ratio of approximately 2.5:1. Essentially identical results are obtained if the sample is exposed to chlorine from either an electrochemical cell or a gas bottle. The PSID yield of Cl super(PLU) ions at the SiL sub(2,3) edge is dominated by X-ray-induced electron stimulated desorption (XESD).
ISSN:0039-6028