Macroparticle-free TiN films prepared by arc ion-plating process
TiN thin films prepared by the arc ion-plating process usually have a significant quantity of macroparticles on their surface. In this experiment a rotating target was used to apply the centrifugal effect to prevent the formation of macroparticles on the surface of TiN thin films. The number of macr...
Gespeichert in:
| Veröffentlicht in: | Surface & coatings technology 1994-12, Vol.68, p.141-145 |
|---|---|
| Hauptverfasser: | , , |
| Format: | Artikel |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | 145 |
|---|---|
| container_issue | |
| container_start_page | 141 |
| container_title | Surface & coatings technology |
| container_volume | 68 |
| creator | Kang, G.H. Uchida, H. Koh, E.S. |
| description | TiN thin films prepared by the arc ion-plating process usually have a significant quantity of macroparticles on their surface. In this experiment a rotating target was used to apply the centrifugal effect to prevent the formation of macroparticles on the surface of TiN thin films. The number of macroparticles was measured using an image analysis method and investigated as a function of the rotational velocity of the target. When the rotational velocity was over 3000 rev min
-1, the number of macroparticles on the film surface was markedly reduced. When the rotational velocity was higher than 4200 rev min
-1, the film surface became almost macroparticle free. |
| doi_str_mv | 10.1016/0257-8972(94)90151-1 |
| format | Article |
| fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_26440721</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><els_id>0257897294901511</els_id><sourcerecordid>26440721</sourcerecordid><originalsourceid>FETCH-LOGICAL-c364t-d341b734a3713fa93972efa2a07779e68b25c9ab6baba9fdbe8cf310661425ce3</originalsourceid><addsrcrecordid>eNp9kD9PwzAQxS0EEqXwDRgyIASDwY6dOF4QqOKfVGAps3VxzsgoTYqdIvXb49CKkemG97t79x4hp5xdccbLa5YXilZa5RdaXmrGC075HpnwSmkqhFT7ZPKHHJKjGD8ZY1xpOSG3L2BDv4IweNsidQExW_jXzPl2GbNVwCRhk9WbDILNfN_RVQuD7z6S1luM8ZgcOGgjnuzmlLw_3C9mT3T-9vg8u5tTK0o50EZIXishQSguHGiRXkEHOTCllMayqvPCaqjLGmrQrqmxsk5wVpZcJgXFlJxv7ybfrzXGwSx9tNi20GG_jiYvpWQq5wmUWzDlijGgM6vglxA2hjMz1mXGLszYhdHS_NZlxrWz3X2IFloXoLM-_u2KgvGqHLGbLYYp67fHYKL12FlsfEA7mKb3__v8ANqKfcI</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>26440721</pqid></control><display><type>article</type><title>Macroparticle-free TiN films prepared by arc ion-plating process</title><source>ScienceDirect Journals (5 years ago - present)</source><creator>Kang, G.H. ; Uchida, H. ; Koh, E.S.</creator><creatorcontrib>Kang, G.H. ; Uchida, H. ; Koh, E.S.</creatorcontrib><description>TiN thin films prepared by the arc ion-plating process usually have a significant quantity of macroparticles on their surface. In this experiment a rotating target was used to apply the centrifugal effect to prevent the formation of macroparticles on the surface of TiN thin films. The number of macroparticles was measured using an image analysis method and investigated as a function of the rotational velocity of the target. When the rotational velocity was over 3000 rev min
-1, the number of macroparticles on the film surface was markedly reduced. When the rotational velocity was higher than 4200 rev min
-1, the film surface became almost macroparticle free.</description><identifier>ISSN: 0257-8972</identifier><identifier>EISSN: 1879-3347</identifier><identifier>DOI: 10.1016/0257-8972(94)90151-1</identifier><identifier>CODEN: SCTEEJ</identifier><language>eng</language><publisher>Lausanne: Elsevier B.V</publisher><subject>Cross-disciplinary physics: materials science; rheology ; Exact sciences and technology ; Ion and electron beam-assisted deposition; ion plating ; Materials science ; Methods of deposition of films and coatings; film growth and epitaxy ; Physics</subject><ispartof>Surface & coatings technology, 1994-12, Vol.68, p.141-145</ispartof><rights>1994 Elsevier Science S.A. All rights reserved</rights><rights>1995 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c364t-d341b734a3713fa93972efa2a07779e68b25c9ab6baba9fdbe8cf310661425ce3</citedby><cites>FETCH-LOGICAL-c364t-d341b734a3713fa93972efa2a07779e68b25c9ab6baba9fdbe8cf310661425ce3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://www.sciencedirect.com/science/article/pii/0257897294901511$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>309,310,314,776,780,785,786,3537,23909,23910,25118,27901,27902,65306</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=3501861$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Kang, G.H.</creatorcontrib><creatorcontrib>Uchida, H.</creatorcontrib><creatorcontrib>Koh, E.S.</creatorcontrib><title>Macroparticle-free TiN films prepared by arc ion-plating process</title><title>Surface & coatings technology</title><description>TiN thin films prepared by the arc ion-plating process usually have a significant quantity of macroparticles on their surface. In this experiment a rotating target was used to apply the centrifugal effect to prevent the formation of macroparticles on the surface of TiN thin films. The number of macroparticles was measured using an image analysis method and investigated as a function of the rotational velocity of the target. When the rotational velocity was over 3000 rev min
-1, the number of macroparticles on the film surface was markedly reduced. When the rotational velocity was higher than 4200 rev min
-1, the film surface became almost macroparticle free.</description><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Exact sciences and technology</subject><subject>Ion and electron beam-assisted deposition; ion plating</subject><subject>Materials science</subject><subject>Methods of deposition of films and coatings; film growth and epitaxy</subject><subject>Physics</subject><issn>0257-8972</issn><issn>1879-3347</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1994</creationdate><recordtype>article</recordtype><recordid>eNp9kD9PwzAQxS0EEqXwDRgyIASDwY6dOF4QqOKfVGAps3VxzsgoTYqdIvXb49CKkemG97t79x4hp5xdccbLa5YXilZa5RdaXmrGC075HpnwSmkqhFT7ZPKHHJKjGD8ZY1xpOSG3L2BDv4IweNsidQExW_jXzPl2GbNVwCRhk9WbDILNfN_RVQuD7z6S1luM8ZgcOGgjnuzmlLw_3C9mT3T-9vg8u5tTK0o50EZIXishQSguHGiRXkEHOTCllMayqvPCaqjLGmrQrqmxsk5wVpZcJgXFlJxv7ybfrzXGwSx9tNi20GG_jiYvpWQq5wmUWzDlijGgM6vglxA2hjMz1mXGLszYhdHS_NZlxrWz3X2IFloXoLM-_u2KgvGqHLGbLYYp67fHYKL12FlsfEA7mKb3__v8ANqKfcI</recordid><startdate>19941201</startdate><enddate>19941201</enddate><creator>Kang, G.H.</creator><creator>Uchida, H.</creator><creator>Koh, E.S.</creator><general>Elsevier B.V</general><general>Elsevier</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>19941201</creationdate><title>Macroparticle-free TiN films prepared by arc ion-plating process</title><author>Kang, G.H. ; Uchida, H. ; Koh, E.S.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c364t-d341b734a3713fa93972efa2a07779e68b25c9ab6baba9fdbe8cf310661425ce3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1994</creationdate><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Exact sciences and technology</topic><topic>Ion and electron beam-assisted deposition; ion plating</topic><topic>Materials science</topic><topic>Methods of deposition of films and coatings; film growth and epitaxy</topic><topic>Physics</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Kang, G.H.</creatorcontrib><creatorcontrib>Uchida, H.</creatorcontrib><creatorcontrib>Koh, E.S.</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Surface & coatings technology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Kang, G.H.</au><au>Uchida, H.</au><au>Koh, E.S.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Macroparticle-free TiN films prepared by arc ion-plating process</atitle><jtitle>Surface & coatings technology</jtitle><date>1994-12-01</date><risdate>1994</risdate><volume>68</volume><spage>141</spage><epage>145</epage><pages>141-145</pages><issn>0257-8972</issn><eissn>1879-3347</eissn><coden>SCTEEJ</coden><abstract>TiN thin films prepared by the arc ion-plating process usually have a significant quantity of macroparticles on their surface. In this experiment a rotating target was used to apply the centrifugal effect to prevent the formation of macroparticles on the surface of TiN thin films. The number of macroparticles was measured using an image analysis method and investigated as a function of the rotational velocity of the target. When the rotational velocity was over 3000 rev min
-1, the number of macroparticles on the film surface was markedly reduced. When the rotational velocity was higher than 4200 rev min
-1, the film surface became almost macroparticle free.</abstract><cop>Lausanne</cop><pub>Elsevier B.V</pub><doi>10.1016/0257-8972(94)90151-1</doi><tpages>5</tpages></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 0257-8972 |
| ispartof | Surface & coatings technology, 1994-12, Vol.68, p.141-145 |
| issn | 0257-8972 1879-3347 |
| language | eng |
| recordid | cdi_proquest_miscellaneous_26440721 |
| source | ScienceDirect Journals (5 years ago - present) |
| subjects | Cross-disciplinary physics: materials science rheology Exact sciences and technology Ion and electron beam-assisted deposition ion plating Materials science Methods of deposition of films and coatings film growth and epitaxy Physics |
| title | Macroparticle-free TiN films prepared by arc ion-plating process |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-02T21%3A32%3A27IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Macroparticle-free%20TiN%20films%20prepared%20by%20arc%20ion-plating%20process&rft.jtitle=Surface%20&%20coatings%20technology&rft.au=Kang,%20G.H.&rft.date=1994-12-01&rft.volume=68&rft.spage=141&rft.epage=145&rft.pages=141-145&rft.issn=0257-8972&rft.eissn=1879-3347&rft.coden=SCTEEJ&rft_id=info:doi/10.1016/0257-8972(94)90151-1&rft_dat=%3Cproquest_cross%3E26440721%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=26440721&rft_id=info:pmid/&rft_els_id=0257897294901511&rfr_iscdi=true |