Hot-filament-assisted chemical vapor deposition of carbon: film growth and filament reactions

Hot-filament-assisted chemical vapor deposition of carbon: film growth and filament reactions

Pure glassy C films as thick as 25 000 Angstroms were grown on nearby Si substrates via reactions between a hot W filament and cyclopentane. The reactions and their temp. dependence were described. 36 refs.

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Veröffentlicht in:Journal of applied physics 1994-01, Vol.76 (2), p.1220-1227
1. Verfasser: Rye, Robert R
Format: Artikel
Sprache:eng
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Zusammenfassung:Pure glassy C films as thick as 25 000 Angstroms were grown on nearby Si substrates via reactions between a hot W filament and cyclopentane. The reactions and their temp. dependence were described. 36 refs.
ISSN:0021-8979