High-accuracy defect-free X-ray mask technology

There are many material and processing options for building highly accurate defect-free X-ray masks that meet the 0.25-µ m and smaller lithography groundrules. IBM's path and rationale for reducing the key mask parameters of image size, image placement and defects is covered. For image size res...

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Veröffentlicht in:	Japanese Journal of Applied Physics 1994-12, Vol.33 (12B), p.6878-6887
Hauptverfasser:	NASH, S. C, FAURE, T. B, LEVIN, J. P, PUISTO, D. M, ROCQUE, J. M, KIMMEL, K. R, MCCORD, M. A, VISWANATHAN, R. G
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Electronics Exact sciences and technology Microelectronic fabrication (materials and surfaces technology) Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Online-Zugang:	Volltext
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