Fabrication of single-crystalline aluminum nanostructures

Single-crystalline Al films were grown on silicon (111) wafers using the method of Miura et al. (1993). The films were patterned into wire structures by electron-beam lithography and dry-etching. For a sub-50 nm line width, the high-resolution part of the pattern was defined in the negative tone of...

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Veröffentlicht in:	Microelectronic engineering 1994-09, Vol.27-30 (1-4), p.117-120
Hauptverfasser:	tuin, A W, van der Kolk, M, Zijlstra, T, Verbruggen, A H, Radelaar, S
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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