Synthesis of a Spatially Confined, Highly Durable, and Fully Exposed Pd Cluster Catalyst via Sequential Site-Selective Atomic Layer Deposition

Bottom-up synthesis based on site-selective atomic layer deposition is a powerful atomic-scale processing approach to fabricate materials with desired functionalities. Typical selective atomic layer deposition (ALD) can be achieved using selective activation of a growth area or selective deactivatio...

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Veröffentlicht in:ACS applied materials & interfaces 2022-03, Vol.14 (12), p.14466-14473
Hauptverfasser: Zuo, Yuqing, Wang, Zeyu, Zhao, Haojie, Zhao, Lianqi, Zhang, Lunjia, Yi, Beili, Bao, Wenda, Zhang, Yue, Su, Longxing, Yu, Yi, Xie, Jin
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Sprache:eng
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