Synthesis of a Spatially Confined, Highly Durable, and Fully Exposed Pd Cluster Catalyst via Sequential Site-Selective Atomic Layer Deposition
Bottom-up synthesis based on site-selective atomic layer deposition is a powerful atomic-scale processing approach to fabricate materials with desired functionalities. Typical selective atomic layer deposition (ALD) can be achieved using selective activation of a growth area or selective deactivatio...
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Veröffentlicht in: | ACS applied materials & interfaces 2022-03, Vol.14 (12), p.14466-14473 |
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Sprache: | eng |
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