Strain accommodation in mismatched layers by molecular beam epitaxy : Introduction of a new compliant substrate technology

Compliant substrates allow a new approach to the growth of strained epitaxial layers, in which part of the strain is accommodated in the substrate. In this article, compliant substrates are discussed and a new compliant substrate technology based on bonded thin film substrates is introduced. This te...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Veröffentlicht in:	Journal of electronic materials 1996-07, Vol.25 (7), p.1044-1048
Hauptverfasser:	CARTER-COMAN, C, BROWN, A. S, JOKERST, N. M, DAWSON, D. E, BICKNELL-TASSIUS, R, FENG, Z. C, RAJKUMAR, K. C, DAGNALL, G
Format:	Artikel
Sprache:	eng
Schlagworte:	Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology Exact sciences and technology Gallium arsenide Low-dimensional structures (superlattices, quantum well structures, multilayers): structure, and nonelectronic properties Materials science Methods of deposition of films and coatings film growth and epitaxy Molecular beam epitaxy Molecular, atomic, ion, and chemical beam epitaxy Physics Semiconductor research Substrates Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties)
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Schreiben Sie den ersten Kommentar!