Contamination determination for silicon carbide Cantilever forks in diffusion furnaces

Atmosphere in the diffusion furnace is not uniformly contaminated. Metal evaporation from the forks may be responsible (Fe, Ni, Cu, and Na) and may be caused by materials and jigs used in SiC fork fabrication.

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Bibliographische Detailangaben
Veröffentlicht in:	Journal of the Electrochemical Society 1994-05, Vol.141 (5), p.1304-1308
1. Verfasser:	ITSUMI, M
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Electronics Exact sciences and technology Microelectronic fabrication (materials and surfaces technology) Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Online-Zugang:	Volltext
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Beschreibung
Zusammenfassung:	Atmosphere in the diffusion furnace is not uniformly contaminated. Metal evaporation from the forks may be responsible (Fe, Ni, Cu, and Na) and may be caused by materials and jigs used in SiC fork fabrication.
ISSN:	0013-4651 1945-7111
DOI:	10.1149/1.2054914