Selective electroless nickel deposition on patterned phosphonate and carboxylate polymer films

Electroless metallization processes have been used to develop photopatterned films of poly(diisopropyl vinylbenzylphosphonate-co-N-methylmaleimide) and deposit metallic nickel selectively in the exposed regions of the films. A 100 A thick film of nickel provides an effective etch mask to the underly...

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Veröffentlicht in:Journal of the Electrochemical Society 1996-02, Vol.143 (2), p.691-695
Hauptverfasser: SCHILLING, M. L, KATZ, H. E, HOULIHAN, F. M, STEIN, S. M, HUTTON, R. S, TAYLOR, G. N
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container_end_page 695
container_issue 2
container_start_page 691
container_title Journal of the Electrochemical Society
container_volume 143
creator SCHILLING, M. L
KATZ, H. E
HOULIHAN, F. M
STEIN, S. M
HUTTON, R. S
TAYLOR, G. N
description Electroless metallization processes have been used to develop photopatterned films of poly(diisopropyl vinylbenzylphosphonate-co-N-methylmaleimide) and deposit metallic nickel selectively in the exposed regions of the films. A 100 A thick film of nickel provides an effective etch mask to the underlying polymer in an oxygen plasma. Carboxylate polymers can also serve as substrates for electroless nickel deposition. These results suggest that phosphonate or carboxylate polymers could potentially serve as imaging layers for at-the-surface imaging approaches to 14 and 193 nm lithography.
doi_str_mv 10.1149/1.1836502
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subjects Applied sciences
Coating, metallization, dyeing
Exact sciences and technology
Machinery and processing
Plastics
Polymer industry, paints, wood
Technology of polymers
title Selective electroless nickel deposition on patterned phosphonate and carboxylate polymer films
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