Automated malfunction diagnosis of semiconductor fabrication equipment: a plasma etch application

A general methodology for the automated diagnosis of integrated circuit fabrication equipment is presented. The technique combines the best aspects of quantitative algorithmic diagnosis and qualitative knowledge-based approaches. Evidence from equipment maintenance history, real-time tool data, and...

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Veröffentlicht in:	IEEE transactions on semiconductor manufacturing 1993-02, Vol.6 (1), p.28-40
Hauptverfasser:	May, G.S., Spanos, C.J.
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Circuit faults Electronics Etching Exact sciences and technology Fabrication Fault diagnosis History Integrated circuit measurements Laboratories Microelectronic fabrication (materials and surfaces technology) Plasma applications Plasma diagnostics Plasma measurements Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
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