THIN ALUMINA AND SILICA FILMS BY CHEMICAL VAPOR DEPOSITION (CVD)

Alumina and silica coatings have been deposited by MOCVD (Metal Organic Chemical Vapor Deposition) on alloys to protect them against high temperature corrosion. Aluminium Tri-lsopropoxide (ATI) and DiAcetoxyDitertiaryButoxySilane (DAOBS) have been used as metal organic precursors to prepare these ce...

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Veröffentlicht in:	Materials and manufacturing processes 1993-05, Vol.8 (3), p.315-329
Hauptverfasser:	Hofrnan, R., Morssinkhof, R.W.J., Fransen, T., Westheim, J.G.F., Gellings, P.J.
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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