Sequential deposition of diamond from sputtered carbon and atomic hydrogen

The growth of diamond thin films on a scratched silicon crystal surface by a chemical-vapor deposition technique is reported. The substrate was bombarded by sputtered carbon from a graphite target in a helium dc glow discharge, and subsequently exposed to atomic hydrogen generated by a hot tungsten...

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Veröffentlicht in:	Journal of applied physics 1993-10, Vol.74 (8), p.5167-5171
Hauptverfasser:	OLSON, D. S, KELLY, M. A, SANJIV KAPOOR, HAGSTROM, S. B
Format:	Artikel
Sprache:	eng
Schlagworte:	Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Cross-disciplinary physics: materials science rheology Exact sciences and technology Materials science Methods of deposition of films and coatings film growth and epitaxy Physics
Online-Zugang:	Volltext
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