A Schottky-emitter electron source for wide range lithography applications

A new 3-lens electron optical column using a Schottky emitter has been designed to perform very high-resolution lithography and also to produce reticles with good throughput. The theoretical performance has been computed from the source and lens characteristics and stochastic beam broadening. Measur...

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Veröffentlicht in:JPN J APPL PHYS PART 1 REGUL PAP SHORT NOTE REV PAP 1993-12, Vol.32 (12B), p.5982-5987
Hauptverfasser: KOEK, B. H, CHISHOLM, T, DAVEY, J. P, ROMIJN, J, VAN RUN, A. J
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container_end_page 5987
container_issue 12B
container_start_page 5982
container_title JPN J APPL PHYS PART 1 REGUL PAP SHORT NOTE REV PAP
container_volume 32
creator KOEK, B. H
CHISHOLM, T
DAVEY, J. P
ROMIJN, J
VAN RUN, A. J
description A new 3-lens electron optical column using a Schottky emitter has been designed to perform very high-resolution lithography and also to produce reticles with good throughput. The theoretical performance has been computed from the source and lens characteristics and stochastic beam broadening. Measurements have shown excellent stability off the beam position and current. The measured current in a given spot-size is not as great as the theory predicts and further investigation is required. Examples are given of nanostructures formed by gold lift-off and of a DRAM reticle. The column is in use by research workers in the Technical University of Delft and examples of masks for Josephson junctions are shown.
doi_str_mv 10.1143/jjap.32.5982
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source IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link
subjects Applied sciences
Electronics
Exact sciences and technology
Microelectronic fabrication (materials and surfaces technology)
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
title A Schottky-emitter electron source for wide range lithography applications
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