Crystallization and martensitic transformation of sputter-deposited Ti-Ni thin films

Ti-Ni alloy films were deposited on quartz substrates by sputtering in argon atmosphere, using a sputtering target of an equiatomic TiNi alloy. The composition of the films was determined by electron probe micro-analysis using a calibration line prepared from bulk samples of well-established composi...

Ausführliche Beschreibung

Bibliographische Detailangaben

Veröffentlicht in:	Nihon Kinzoku Gakkai shi (1952) 1996-10, Vol.60 (1), p.921-927
Hauptverfasser:	Kwamura, Yoshio, Gyobu, Atsuo, Horikawa, Hiroshi, Saburu, Toshio
Format:	Artikel
Sprache:	jpn
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!