Process study of silicon carbide coatings deposited on steel by plasma-assisted chemical vapor deposition from tetramethylsilane-argon gas system

Silicon carbide coatings were prepared in an RF plasma-assisted chemical vapor deposition (CVD) device from the tetramethylsilane-argon gas system. The present paper is devoted to investigation of the plasma process and determination of the deposition rate with the experimental parameters. By employ...

Ausführliche Beschreibung

Bibliographische Detailangaben

Veröffentlicht in:	Japanese Journal of Applied Physics 1992-12, Vol.31 (12A), p.4053-4060
Hauptverfasser:	WEI ZHANG, LELOGEAIS, M, DUCARROIR, M
Format:	Artikel
Sprache:	eng
Schlagworte:	Condensed matter: structure, mechanical and thermal properties Exact sciences and technology Physics Solid surfaces and solid-solid interfaces Surface and interface dynamics and vibrations Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Thin film structure and morphology
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!