Morphology of electrochemical vapor deposited yttria-stabilized zirconia thin films
Yttria-stabilized zirconia films were deposited over alumina substrates by electrochemical vapor deposition (EVD). It was observed that the films grew with the same yttrium-to-zircomium ratio as in the reactant gases. Films deposited at temperatures of 1075°C or below have a highly faceted surface a...
Gespeichert in:
| Veröffentlicht in: | Solid state ionics 1990-01, Vol.37 (2), p.197-202 |
|---|---|
| Hauptverfasser: | , |
| Format: | Artikel |
| Sprache: | eng |
| Online-Zugang: | Volltext |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Schreiben Sie den ersten Kommentar!