Measurement of surface Fermi level in phosphidized GaAs
The location of the surface Fermi level in phosphidized GaAs has been investigated using the Kelvin probe method. The surface Fermi level changes from an energy around 0.47 eV below the conduction band edge for the as-etched surface covered with a natural oxide layer to an energy of 0.25 eV after su...
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Veröffentlicht in: | Japanese Journal of Applied Physics 1992-11, Vol.31 (11A), p.L1522-L1524 |
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container_issue | 11A |
container_start_page | L1522 |
container_title | Japanese Journal of Applied Physics |
container_volume | 31 |
creator | SUGINO, T YAMADA, T KONDO, K NINOMIYA, H MATSUDA, K SHIRAFUJI, J |
description | The location of the surface Fermi level in phosphidized GaAs has been investigated using the Kelvin probe method. The surface Fermi level changes from an energy around 0.47 eV below the conduction band edge for the as-etched surface covered with a natural oxide layer to an energy of 0.25 eV after sufficient phosphidization by phosphine (PH
3
)-plasma treatment. On the other hand, isothermal capacitance transient spectroscopy measurement reveals that a new electron trap with an activation energy of 0.24 eV is introduced at or near the phosphidized surface. This provides experimental evidence that the location of the surface Fermi level is closely associated with that of the electron trap induced by PH
3
-plasma treatment. |
doi_str_mv | 10.1143/jjap.31.l1522 |
format | Article |
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3
)-plasma treatment. On the other hand, isothermal capacitance transient spectroscopy measurement reveals that a new electron trap with an activation energy of 0.24 eV is introduced at or near the phosphidized surface. This provides experimental evidence that the location of the surface Fermi level is closely associated with that of the electron trap induced by PH
3
-plasma treatment.</description><identifier>ISSN: 0021-4922</identifier><identifier>EISSN: 1347-4065</identifier><identifier>DOI: 10.1143/jjap.31.l1522</identifier><identifier>CODEN: JJAPA5</identifier><language>eng</language><publisher>Tokyo: Japanese journal of applied physics</publisher><subject>Condensed matter: electronic structure, electrical, magnetic, and optical properties ; Electron states ; Exact sciences and technology ; Fermi surface: calculations and measurements; effective mass, g factor ; Physics</subject><ispartof>Japanese Journal of Applied Physics, 1992-11, Vol.31 (11A), p.L1522-L1524</ispartof><rights>1993 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c390t-226992c1e5307032a4e49be102ad7745a8cd0f913fde7ebba623072899bb190f3</citedby><cites>FETCH-LOGICAL-c390t-226992c1e5307032a4e49be102ad7745a8cd0f913fde7ebba623072899bb190f3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27923,27924</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=4377607$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>SUGINO, T</creatorcontrib><creatorcontrib>YAMADA, T</creatorcontrib><creatorcontrib>KONDO, K</creatorcontrib><creatorcontrib>NINOMIYA, H</creatorcontrib><creatorcontrib>MATSUDA, K</creatorcontrib><creatorcontrib>SHIRAFUJI, J</creatorcontrib><title>Measurement of surface Fermi level in phosphidized GaAs</title><title>Japanese Journal of Applied Physics</title><description>The location of the surface Fermi level in phosphidized GaAs has been investigated using the Kelvin probe method. The surface Fermi level changes from an energy around 0.47 eV below the conduction band edge for the as-etched surface covered with a natural oxide layer to an energy of 0.25 eV after sufficient phosphidization by phosphine (PH
3
)-plasma treatment. On the other hand, isothermal capacitance transient spectroscopy measurement reveals that a new electron trap with an activation energy of 0.24 eV is introduced at or near the phosphidized surface. This provides experimental evidence that the location of the surface Fermi level is closely associated with that of the electron trap induced by PH
3
-plasma treatment.</description><subject>Condensed matter: electronic structure, electrical, magnetic, and optical properties</subject><subject>Electron states</subject><subject>Exact sciences and technology</subject><subject>Fermi surface: calculations and measurements; effective mass, g factor</subject><subject>Physics</subject><issn>0021-4922</issn><issn>1347-4065</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1992</creationdate><recordtype>article</recordtype><recordid>eNo9kE1PAjEYhBujiYgevfdgvC32bbtbeiREUILRg56bbvdtKNkvWzDRX88SiKeZSZ6ZwxByD2wCIMXTdmv7iYBJDTnnF2QEQqpMsiK_JCPGOGRSc35NblLaDrHIJYyIekOb9hEbbHe083Tw3jqkC4xNoDX-YE1DS_tNl_pNqMIfVnRpZ-mWXHlbJ7w765h8LZ4_5y_Z-n35Op-tMyc022WcF1pzB5gLppjgVqLUJQLjtlJK5nbqKuY1CF-hwrK0BR9APtW6LEEzL8bk8bTbx-57j2lnmpAc1rVtsdsnw3MlBHA1gNkJdLFLKaI3fQyNjb8GmDneY1ar2YcRYNbHewb-4Txsk7O1j7Z1If2XpFCqYEocAOoBY9o</recordid><startdate>19921101</startdate><enddate>19921101</enddate><creator>SUGINO, T</creator><creator>YAMADA, T</creator><creator>KONDO, K</creator><creator>NINOMIYA, H</creator><creator>MATSUDA, K</creator><creator>SHIRAFUJI, J</creator><general>Japanese journal of applied physics</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>7U5</scope><scope>8FD</scope><scope>L7M</scope></search><sort><creationdate>19921101</creationdate><title>Measurement of surface Fermi level in phosphidized GaAs</title><author>SUGINO, T ; YAMADA, T ; KONDO, K ; NINOMIYA, H ; MATSUDA, K ; SHIRAFUJI, J</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c390t-226992c1e5307032a4e49be102ad7745a8cd0f913fde7ebba623072899bb190f3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1992</creationdate><topic>Condensed matter: electronic structure, electrical, magnetic, and optical properties</topic><topic>Electron states</topic><topic>Exact sciences and technology</topic><topic>Fermi surface: calculations and measurements; effective mass, g factor</topic><topic>Physics</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>SUGINO, T</creatorcontrib><creatorcontrib>YAMADA, T</creatorcontrib><creatorcontrib>KONDO, K</creatorcontrib><creatorcontrib>NINOMIYA, H</creatorcontrib><creatorcontrib>MATSUDA, K</creatorcontrib><creatorcontrib>SHIRAFUJI, J</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Japanese Journal of Applied Physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>SUGINO, T</au><au>YAMADA, T</au><au>KONDO, K</au><au>NINOMIYA, H</au><au>MATSUDA, K</au><au>SHIRAFUJI, J</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Measurement of surface Fermi level in phosphidized GaAs</atitle><jtitle>Japanese Journal of Applied Physics</jtitle><date>1992-11-01</date><risdate>1992</risdate><volume>31</volume><issue>11A</issue><spage>L1522</spage><epage>L1524</epage><pages>L1522-L1524</pages><issn>0021-4922</issn><eissn>1347-4065</eissn><coden>JJAPA5</coden><abstract>The location of the surface Fermi level in phosphidized GaAs has been investigated using the Kelvin probe method. The surface Fermi level changes from an energy around 0.47 eV below the conduction band edge for the as-etched surface covered with a natural oxide layer to an energy of 0.25 eV after sufficient phosphidization by phosphine (PH
3
)-plasma treatment. On the other hand, isothermal capacitance transient spectroscopy measurement reveals that a new electron trap with an activation energy of 0.24 eV is introduced at or near the phosphidized surface. This provides experimental evidence that the location of the surface Fermi level is closely associated with that of the electron trap induced by PH
3
-plasma treatment.</abstract><cop>Tokyo</cop><pub>Japanese journal of applied physics</pub><doi>10.1143/jjap.31.l1522</doi></addata></record> |
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source | IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link |
subjects | Condensed matter: electronic structure, electrical, magnetic, and optical properties Electron states Exact sciences and technology Fermi surface: calculations and measurements effective mass, g factor Physics |
title | Measurement of surface Fermi level in phosphidized GaAs |
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