Kinetics and uniformity of deposition of borophosphosilicate glass from silane and oxygen in a single-wafer reactor

We have characterized the average rate of deposition and radial variation of film thickness for boron- and phosphorus-doped silica glasses deposited in a prototype single-wafer chemical vapor deposition system, using multifactor experimental designs to elucidate efficiently the effects of various pr...

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Veröffentlicht in:	Journal of the Electrochemical Society 1992-09, Vol.139 (9), p.2573-2579
1. Verfasser:	DOBKIN, D. M
Format:	Artikel
Sprache:	eng
Schlagworte:	Condensed matter: structure, mechanical and thermal properties Exact sciences and technology Physics Solid surfaces and solid-solid interfaces Surface and interface dynamics and vibrations Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Thin film structure and morphology
Online-Zugang:	Volltext
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