Formation of diamond films from low pressure radio frequency induction discharges

Diamond films have been deposited in a low pressure, radio frequency (r.f.) induction plasma-assisted chemical vapor deposition system. The r.f.-induction system confines the plasma at the low pressures of operation 0.010–10.00 Torr to permit efficient dissociation of the reactant gases. A variety o...

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Veröffentlicht in:	Surface & coatings technology 1992, Vol.54 (1-3), p.397-402
Hauptverfasser:	Rudder, R.A., Hudson, G.C., Hendry, R.C., Thomas, R.E., Posthill, J.B., Markunas, R.J.
Format:	Artikel
Sprache:	eng
Schlagworte:	Condensed matter: structure, mechanical and thermal properties Exact sciences and technology Physics Solid surfaces and solid-solid interfaces Surface and interface dynamics and vibrations Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Thin film structure and morphology
Online-Zugang:	Volltext
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