Wet etch process for patterning insulators suitable for epitaxial high Tc superconducting thin film multilevel electronic circuits

A wet etch process is described for patterning insulators suitable for multilayer epitaxial high Tc superconductor-insulator-superconductor structures down to micrometer-scale dimensions. A solution of 7 percent HF in water gives convenient etch rates for SrTiO3 and MgO insulators (about 1500 A/min...

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Veröffentlicht in:	Applied physics letters 1991-09, Vol.59 (10), p.1257-1259
Hauptverfasser:	EIDELLOTH, W, GALLAGHER, W. J, ROBERTAZZI, R. P, KOCH, R. H, OH, B, SANDSTROM, R. L
Format:	Artikel
Sprache:	eng
Schlagworte:	Condensed matter: structure, mechanical and thermal properties Exact sciences and technology Low-dimensional structures (superlattices, quantum well structures, multilayers): structure, and nonelectronic properties Physics Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties)
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