Evaluation of some mechanical properties of SiC films deposited on steel by plasma-assisted chemical vapour deposition from tetramethylsilane

Deposits of SiC with various Si:C atomic ratios were obtained. The growth rates are high and their variations are explained in terms of competition between different mechanisms. The hardness and adherence measured by scratch testing are a strong function of the coating composition. Hardness values a...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Surface & coatings technology 1991-11, Vol.48 (2), p.121-129
Hauptverfasser: Lelogeais, M., Ducarroir, M.
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page 129
container_issue 2
container_start_page 121
container_title Surface & coatings technology
container_volume 48
creator Lelogeais, M.
Ducarroir, M.
description Deposits of SiC with various Si:C atomic ratios were obtained. The growth rates are high and their variations are explained in terms of competition between different mechanisms. The hardness and adherence measured by scratch testing are a strong function of the coating composition. Hardness values at infinite loads were determined by a correction method. They range from 2300 to 3500 kgf mm -2 with an excess of silicon; conversely a few per cent of free carbon drastically lowers the hardness. Stresses were evaluated by radii curvature measurements. The variation of “normalized critical load” can be explained by an energy balance only if an energetic term of cohesive failure is introduced. Although the L c values are low, adherence is good and goes through a maximum when the Si:C ratio reaches 1.2.
doi_str_mv 10.1016/0257-8972(91)90135-J
format Article
fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_25526853</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><els_id>025789729190135J</els_id><sourcerecordid>25526853</sourcerecordid><originalsourceid>FETCH-LOGICAL-c395t-4586a4e88cf027c96b12aa2d7088ee764f174b923334e9e652c4d279f001c4563</originalsourceid><addsrcrecordid>eNqNkcFu1DAQhi0EEkvhDTj4gBAcUmzHjuMLEloVaFWJA3C2vM5Ya5TEweNdaR-Cd67TLT0iTnOY75-Zf35CXnN2yRnvPjChdNMbLd4Z_t4w3qrm5gnZ8F6bpm2lfko2j8hz8gLxF2OMayM35M_V0Y0HV2KaaQoU0wR0Ar93c_RupEtOC-QSAdfu97ilIY4T0gGWhLHAQKsOC8BIdye6jA4n1zjEiGvP72G6H3N0Szrkv6p1V8hpogVKdhOU_WnEOLoZXpJnwY0Irx7qBfn5-erH9mtz--3L9fbTbeNbo0ojVd85CX3vAxPam27HhXNi0KzvAXQnA9dyZ0RbzYOBTgkvB6FNqK69VF17Qd6e51Z_vw-AxU4RPYzrDemAViglul61_wXKek4F5Rn0OSFmCHbJcXL5ZDmza0h2TcCuCVjD7X1I9qbK3jzMd1gfFbKbfcRHrWwZF62u2MczBvUpxwjZoo8wexhiBl_skOK_99wBrIioLg</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>25524458</pqid></control><display><type>article</type><title>Evaluation of some mechanical properties of SiC films deposited on steel by plasma-assisted chemical vapour deposition from tetramethylsilane</title><source>ScienceDirect Journals (5 years ago - present)</source><creator>Lelogeais, M. ; Ducarroir, M.</creator><creatorcontrib>Lelogeais, M. ; Ducarroir, M.</creatorcontrib><description>Deposits of SiC with various Si:C atomic ratios were obtained. The growth rates are high and their variations are explained in terms of competition between different mechanisms. The hardness and adherence measured by scratch testing are a strong function of the coating composition. Hardness values at infinite loads were determined by a correction method. They range from 2300 to 3500 kgf mm -2 with an excess of silicon; conversely a few per cent of free carbon drastically lowers the hardness. Stresses were evaluated by radii curvature measurements. The variation of “normalized critical load” can be explained by an energy balance only if an energetic term of cohesive failure is introduced. Although the L c values are low, adherence is good and goes through a maximum when the Si:C ratio reaches 1.2.</description><identifier>ISSN: 0257-8972</identifier><identifier>EISSN: 1879-3347</identifier><identifier>DOI: 10.1016/0257-8972(91)90135-J</identifier><identifier>CODEN: SCTEEJ</identifier><language>eng</language><publisher>Lausanne: Elsevier B.V</publisher><subject>Applied sciences ; Condensed matter: structure, mechanical and thermal properties ; Exact sciences and technology ; Metals. Metallurgy ; Physics ; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</subject><ispartof>Surface &amp; coatings technology, 1991-11, Vol.48 (2), p.121-129</ispartof><rights>1991</rights><rights>1993 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c395t-4586a4e88cf027c96b12aa2d7088ee764f174b923334e9e652c4d279f001c4563</citedby><cites>FETCH-LOGICAL-c395t-4586a4e88cf027c96b12aa2d7088ee764f174b923334e9e652c4d279f001c4563</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://dx.doi.org/10.1016/0257-8972(91)90135-J$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>314,780,784,3548,27922,27923,45993</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&amp;idt=4301237$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Lelogeais, M.</creatorcontrib><creatorcontrib>Ducarroir, M.</creatorcontrib><title>Evaluation of some mechanical properties of SiC films deposited on steel by plasma-assisted chemical vapour deposition from tetramethylsilane</title><title>Surface &amp; coatings technology</title><description>Deposits of SiC with various Si:C atomic ratios were obtained. The growth rates are high and their variations are explained in terms of competition between different mechanisms. The hardness and adherence measured by scratch testing are a strong function of the coating composition. Hardness values at infinite loads were determined by a correction method. They range from 2300 to 3500 kgf mm -2 with an excess of silicon; conversely a few per cent of free carbon drastically lowers the hardness. Stresses were evaluated by radii curvature measurements. The variation of “normalized critical load” can be explained by an energy balance only if an energetic term of cohesive failure is introduced. Although the L c values are low, adherence is good and goes through a maximum when the Si:C ratio reaches 1.2.</description><subject>Applied sciences</subject><subject>Condensed matter: structure, mechanical and thermal properties</subject><subject>Exact sciences and technology</subject><subject>Metals. Metallurgy</subject><subject>Physics</subject><subject>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</subject><issn>0257-8972</issn><issn>1879-3347</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1991</creationdate><recordtype>article</recordtype><recordid>eNqNkcFu1DAQhi0EEkvhDTj4gBAcUmzHjuMLEloVaFWJA3C2vM5Ya5TEweNdaR-Cd67TLT0iTnOY75-Zf35CXnN2yRnvPjChdNMbLd4Z_t4w3qrm5gnZ8F6bpm2lfko2j8hz8gLxF2OMayM35M_V0Y0HV2KaaQoU0wR0Ar93c_RupEtOC-QSAdfu97ilIY4T0gGWhLHAQKsOC8BIdye6jA4n1zjEiGvP72G6H3N0Szrkv6p1V8hpogVKdhOU_WnEOLoZXpJnwY0Irx7qBfn5-erH9mtz--3L9fbTbeNbo0ojVd85CX3vAxPam27HhXNi0KzvAXQnA9dyZ0RbzYOBTgkvB6FNqK69VF17Qd6e51Z_vw-AxU4RPYzrDemAViglul61_wXKek4F5Rn0OSFmCHbJcXL5ZDmza0h2TcCuCVjD7X1I9qbK3jzMd1gfFbKbfcRHrWwZF62u2MczBvUpxwjZoo8wexhiBl_skOK_99wBrIioLg</recordid><startdate>19911101</startdate><enddate>19911101</enddate><creator>Lelogeais, M.</creator><creator>Ducarroir, M.</creator><general>Elsevier B.V</general><general>Elsevier</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope><scope>7U5</scope><scope>L7M</scope></search><sort><creationdate>19911101</creationdate><title>Evaluation of some mechanical properties of SiC films deposited on steel by plasma-assisted chemical vapour deposition from tetramethylsilane</title><author>Lelogeais, M. ; Ducarroir, M.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c395t-4586a4e88cf027c96b12aa2d7088ee764f174b923334e9e652c4d279f001c4563</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1991</creationdate><topic>Applied sciences</topic><topic>Condensed matter: structure, mechanical and thermal properties</topic><topic>Exact sciences and technology</topic><topic>Metals. Metallurgy</topic><topic>Physics</topic><topic>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Lelogeais, M.</creatorcontrib><creatorcontrib>Ducarroir, M.</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Surface &amp; coatings technology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Lelogeais, M.</au><au>Ducarroir, M.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Evaluation of some mechanical properties of SiC films deposited on steel by plasma-assisted chemical vapour deposition from tetramethylsilane</atitle><jtitle>Surface &amp; coatings technology</jtitle><date>1991-11-01</date><risdate>1991</risdate><volume>48</volume><issue>2</issue><spage>121</spage><epage>129</epage><pages>121-129</pages><issn>0257-8972</issn><eissn>1879-3347</eissn><coden>SCTEEJ</coden><abstract>Deposits of SiC with various Si:C atomic ratios were obtained. The growth rates are high and their variations are explained in terms of competition between different mechanisms. The hardness and adherence measured by scratch testing are a strong function of the coating composition. Hardness values at infinite loads were determined by a correction method. They range from 2300 to 3500 kgf mm -2 with an excess of silicon; conversely a few per cent of free carbon drastically lowers the hardness. Stresses were evaluated by radii curvature measurements. The variation of “normalized critical load” can be explained by an energy balance only if an energetic term of cohesive failure is introduced. Although the L c values are low, adherence is good and goes through a maximum when the Si:C ratio reaches 1.2.</abstract><cop>Lausanne</cop><pub>Elsevier B.V</pub><doi>10.1016/0257-8972(91)90135-J</doi><tpages>9</tpages></addata></record>
fulltext fulltext
identifier ISSN: 0257-8972
ispartof Surface & coatings technology, 1991-11, Vol.48 (2), p.121-129
issn 0257-8972
1879-3347
language eng
recordid cdi_proquest_miscellaneous_25526853
source ScienceDirect Journals (5 years ago - present)
subjects Applied sciences
Condensed matter: structure, mechanical and thermal properties
Exact sciences and technology
Metals. Metallurgy
Physics
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
title Evaluation of some mechanical properties of SiC films deposited on steel by plasma-assisted chemical vapour deposition from tetramethylsilane
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-13T20%3A39%3A50IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Evaluation%20of%20some%20mechanical%20properties%20of%20SiC%20films%20deposited%20on%20steel%20by%20plasma-assisted%20chemical%20vapour%20deposition%20from%20tetramethylsilane&rft.jtitle=Surface%20&%20coatings%20technology&rft.au=Lelogeais,%20M.&rft.date=1991-11-01&rft.volume=48&rft.issue=2&rft.spage=121&rft.epage=129&rft.pages=121-129&rft.issn=0257-8972&rft.eissn=1879-3347&rft.coden=SCTEEJ&rft_id=info:doi/10.1016/0257-8972(91)90135-J&rft_dat=%3Cproquest_cross%3E25526853%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=25524458&rft_id=info:pmid/&rft_els_id=025789729190135J&rfr_iscdi=true