The deduction of ballistic atomic mixing rates from high fluence ion implant collection depth distributions
An analysis is made, based upon differential atomic transport fluxes in a substrate resulting from implant ion collection, ballistically stimulated atomic relocation or mixing and surface sputtering, of the evolution of equivalent atom concentration-depth profiles in a substrate as a function of inc...
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Veröffentlicht in: | Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms Beam interactions with materials and atoms, 1989-04, Vol.36 (4), p.404-411 |
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Format: | Artikel |
Sprache: | eng |
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