Soft x-ray lenses with 400 A outer zone width for nanostructure imaging

Fresnel zone plate lenses designed for imaging and microscopy at soft x-ray wavelengths have been fabricated with outer zone widths of 400 A. The zone plates were fabricated by electron beam lithography using a high resolution vector scan system designed specifically for nanometer pattern writing an...

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Veröffentlicht in:Microelectronic engineering 1989-01, Vol.9 (1-4), p.87-88
Hauptverfasser: Vladimirsky, Y, Kern, D P, Meyer-Ilse, W, Greinke, B, Guttmann, P, Rishton, S A, Attwood, D
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container_end_page 88
container_issue 1-4
container_start_page 87
container_title Microelectronic engineering
container_volume 9
creator Vladimirsky, Y
Kern, D P
Meyer-Ilse, W
Greinke, B
Guttmann, P
Rishton, S A
Attwood, D
description Fresnel zone plate lenses designed for imaging and microscopy at soft x-ray wavelengths have been fabricated with outer zone widths of 400 A. The zone plates were fabricated by electron beam lithography using a high resolution vector scan system designed specifically for nanometer pattern writing and equipped with high speed polar to cartesian converter for circular pattern generation. Gold electroplating was used to form the absorber pattern. Special measures taken to assure pattern fidelity will be described.
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fullrecord <record><control><sourceid>proquest</sourceid><recordid>TN_cdi_proquest_miscellaneous_25448381</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>25448381</sourcerecordid><originalsourceid>FETCH-proquest_miscellaneous_254483813</originalsourceid><addsrcrecordid>eNqNijkOwjAQAF2ARDj-sBVdJIcYEkqEOHroIytsgpHjBa8tjteTggdQjWY0A5HIbFWk6zwrRmLMfJO9K1km4nCiJsAr9foNFh0jw9OEKygpYQMUA3r4kMO-XvrckAenHXHwsQ7RI5hOt8a1UzFstGWc_TgR8_3uvD2md0-PiByqznCN1mqHFLlaLJUq8zLL_x6_tXc9pA</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>25448381</pqid></control><display><type>article</type><title>Soft x-ray lenses with 400 A outer zone width for nanostructure imaging</title><source>ScienceDirect Journals (5 years ago - present)</source><creator>Vladimirsky, Y ; Kern, D P ; Meyer-Ilse, W ; Greinke, B ; Guttmann, P ; Rishton, S A ; Attwood, D</creator><creatorcontrib>Vladimirsky, Y ; Kern, D P ; Meyer-Ilse, W ; Greinke, B ; Guttmann, P ; Rishton, S A ; Attwood, D</creatorcontrib><description>Fresnel zone plate lenses designed for imaging and microscopy at soft x-ray wavelengths have been fabricated with outer zone widths of 400 A. The zone plates were fabricated by electron beam lithography using a high resolution vector scan system designed specifically for nanometer pattern writing and equipped with high speed polar to cartesian converter for circular pattern generation. Gold electroplating was used to form the absorber pattern. Special measures taken to assure pattern fidelity will be described.</description><identifier>ISSN: 0167-9317</identifier><language>eng</language><ispartof>Microelectronic engineering, 1989-01, Vol.9 (1-4), p.87-88</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>315,781,785</link.rule.ids></links><search><creatorcontrib>Vladimirsky, Y</creatorcontrib><creatorcontrib>Kern, D P</creatorcontrib><creatorcontrib>Meyer-Ilse, W</creatorcontrib><creatorcontrib>Greinke, B</creatorcontrib><creatorcontrib>Guttmann, P</creatorcontrib><creatorcontrib>Rishton, S A</creatorcontrib><creatorcontrib>Attwood, D</creatorcontrib><title>Soft x-ray lenses with 400 A outer zone width for nanostructure imaging</title><title>Microelectronic engineering</title><description>Fresnel zone plate lenses designed for imaging and microscopy at soft x-ray wavelengths have been fabricated with outer zone widths of 400 A. The zone plates were fabricated by electron beam lithography using a high resolution vector scan system designed specifically for nanometer pattern writing and equipped with high speed polar to cartesian converter for circular pattern generation. Gold electroplating was used to form the absorber pattern. Special measures taken to assure pattern fidelity will be described.</description><issn>0167-9317</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1989</creationdate><recordtype>article</recordtype><recordid>eNqNijkOwjAQAF2ARDj-sBVdJIcYEkqEOHroIytsgpHjBa8tjteTggdQjWY0A5HIbFWk6zwrRmLMfJO9K1km4nCiJsAr9foNFh0jw9OEKygpYQMUA3r4kMO-XvrckAenHXHwsQ7RI5hOt8a1UzFstGWc_TgR8_3uvD2md0-PiByqznCN1mqHFLlaLJUq8zLL_x6_tXc9pA</recordid><startdate>19890101</startdate><enddate>19890101</enddate><creator>Vladimirsky, Y</creator><creator>Kern, D P</creator><creator>Meyer-Ilse, W</creator><creator>Greinke, B</creator><creator>Guttmann, P</creator><creator>Rishton, S A</creator><creator>Attwood, D</creator><scope>7SP</scope><scope>8FD</scope><scope>L7M</scope></search><sort><creationdate>19890101</creationdate><title>Soft x-ray lenses with 400 A outer zone width for nanostructure imaging</title><author>Vladimirsky, Y ; Kern, D P ; Meyer-Ilse, W ; Greinke, B ; Guttmann, P ; Rishton, S A ; Attwood, D</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-proquest_miscellaneous_254483813</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1989</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Vladimirsky, Y</creatorcontrib><creatorcontrib>Kern, D P</creatorcontrib><creatorcontrib>Meyer-Ilse, W</creatorcontrib><creatorcontrib>Greinke, B</creatorcontrib><creatorcontrib>Guttmann, P</creatorcontrib><creatorcontrib>Rishton, S A</creatorcontrib><creatorcontrib>Attwood, D</creatorcontrib><collection>Electronics &amp; Communications Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Microelectronic engineering</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Vladimirsky, Y</au><au>Kern, D P</au><au>Meyer-Ilse, W</au><au>Greinke, B</au><au>Guttmann, P</au><au>Rishton, S A</au><au>Attwood, D</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Soft x-ray lenses with 400 A outer zone width for nanostructure imaging</atitle><jtitle>Microelectronic engineering</jtitle><date>1989-01-01</date><risdate>1989</risdate><volume>9</volume><issue>1-4</issue><spage>87</spage><epage>88</epage><pages>87-88</pages><issn>0167-9317</issn><abstract>Fresnel zone plate lenses designed for imaging and microscopy at soft x-ray wavelengths have been fabricated with outer zone widths of 400 A. The zone plates were fabricated by electron beam lithography using a high resolution vector scan system designed specifically for nanometer pattern writing and equipped with high speed polar to cartesian converter for circular pattern generation. Gold electroplating was used to form the absorber pattern. Special measures taken to assure pattern fidelity will be described.</abstract></addata></record>
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title Soft x-ray lenses with 400 A outer zone width for nanostructure imaging
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-15T07%3A58%3A42IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Soft%20x-ray%20lenses%20with%20400%20A%20outer%20zone%20width%20for%20nanostructure%20imaging&rft.jtitle=Microelectronic%20engineering&rft.au=Vladimirsky,%20Y&rft.date=1989-01-01&rft.volume=9&rft.issue=1-4&rft.spage=87&rft.epage=88&rft.pages=87-88&rft.issn=0167-9317&rft_id=info:doi/&rft_dat=%3Cproquest%3E25448381%3C/proquest%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=25448381&rft_id=info:pmid/&rfr_iscdi=true