Morphological features of Y-Ba-Cu-O deposits obtained by in situ radio-frequency magnetron sputtering

The microstructure of rf sputtered high Tc thin superconducting films depends on the sputtering gas pressure and the substrate temperature and can be changed within wide limits. The temperature of 650 C during in-situ deposition on (100) MgO by rf magnetron sputtering is not high enough to provide h...

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Veröffentlicht in:	Journal of materials science letters 1991, Vol.10 (19), p.1168-1170
Hauptverfasser:	PODKLETNOV, E. E, JARVINEN, R. J. O, VUORINEN, P. T, MANTYLA, T. A
Format:	Artikel
Sprache:	eng
Schlagworte:	Cross-disciplinary physics: materials science rheology Deposition by sputtering Exact sciences and technology Materials science Methods of deposition of films and coatings film growth and epitaxy Physics
Online-Zugang:	Volltext
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Zusammenfassung:	The microstructure of rf sputtered high Tc thin superconducting films depends on the sputtering gas pressure and the substrate temperature and can be changed within wide limits. The temperature of 650 C during in-situ deposition on (100) MgO by rf magnetron sputtering is not high enough to provide highly oriented epitaxial growth of 123-compound. High-temperature annealing (850 C) after sputtering with slow cooling yields rectangular single crystals, whereas a high sputtering pressure of 66.5 Pa and temperature of 720 C are favourable for whisker growth. 10 refs.
ISSN:	0261-8028
DOI:	10.1007/BF00744116