Characterization of surface layers produced by ion implantation of nitrogen in bulk aluminium
Surface layers of overall extent less than 400 nm have been generated by ion implantation of nitrogen as N + or N + 2 at energies of 50 and 100 keV into high-purity aluminum sheet at ambient temperature. These layers have been characterized by Auger electron spectroscopy with concurrent ion etching,...
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Veröffentlicht in: | Thin solid films 1989-01, Vol.168 (2), p.263-280 |
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