Bright field alignment marks for optical lithography

Wafer steppers in semiconductor manufacturing depend on failure-free pattern recognition for automatic wafer alignment. For this purpose, the principle of reflection contrast between an alignment mark and the neighbouring area on a semiconductor wafer was investigated. Good agreement between experim...

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Veröffentlicht in:	Microelectronic engineering 1991, Vol.14 (1), p.59-70
1. Verfasser:	ABLASSMEIER, U
Format:	Artikel
Sprache:	eng
Schlagworte:	alignment marks Applied sciences contrast Electronics Exact sciences and technology GaAs Microelectronic fabrication (materials and surfaces technology) Optical lithography reflectivity Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices wafer stepper
Online-Zugang:	Volltext
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