Temperature dependence of interface anisotropy in Ni/Mo multilayers
Equal layer thickness Ni/Mo multilayer samples ranging in Ni layer thickness d from 14 to 340 Å have been investigated by x-band ferromagnetic resonance at temperatures between 4 and 293 K. The dependence of anisotropy (less demagnetization) Ha upon d clearly indicates the interface anisotropy plays...
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Veröffentlicht in: | J. Appl. Phys.; (United States) 1988-11, Vol.64 (10), p.5754-5756 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | Equal layer thickness Ni/Mo multilayer samples ranging in Ni layer thickness d from 14 to 340 Å have been investigated by x-band ferromagnetic resonance at temperatures between 4 and 293 K. The dependence of anisotropy (less demagnetization) Ha upon d clearly indicates the interface anisotropy plays a significant role in these samples. Interface (Ks) and volume (Kv) contributions to the anisotropy are extracted at each temperature using an approximate form of Ha=2(Kv+2Ks/d)/M. The Ks temperature dependence is shown to be inconsistent with a simple mean field model and indicates that interface strain due to the Ni-Mo lattice mismatch is largely responsible for the origin of Ks. |
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ISSN: | 0021-8979 1089-7550 |
DOI: | 10.1063/1.342248 |